At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems

Applied Optics

Volumn 39, Issue 17, 2000, Pages 2941-2947

  Naulleau, Patrick ^a   Goldberg, Kenneth A ^a   Gullikson, Eric M ^a   Bokor, Jeffrey ^a,b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; DIFFRACTIVE OPTICS; INTERFEROMETERS; PHASE SHIFT; PHOTOLITHOGRAPHY;

WAVE FRONT;

OPTICAL SYSTEMS;

EID: 0001016151     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.002941     Document Type: Article

References (20)

1. J. E. Bjorkholm, A. A. MacDowell, O. R. Wood II, Z. Tan, B. LaFontaine, and D. M. Tennant, “Phase-measuring inter-ferometry using extreme ultraviolet radiation, ” J. Vac. Sci. Technol. B 13, 2919-2922 (1995).
2. A. K. Ray-Chaudhuri, W. Ng, F. Cerrina, Z. Tan, J. Bjorkholm, D. Tennant, and S. J. Spector, “Alignment of a multilayer-coated imaging system using extreme ultraviolet Foucault and Ronchi interferometric testing, ” J. Vac. Sci. Technol. B 13, 3089-3093 (1995).
3. H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, “Phase-shifting point diffraction interferometer, ” Opt. Lett. 21, 1526-1528 (1996).
4. K. A. Goldberg, “Extreme ultraviolet interferometry, ” Ph.D. dissertation (University of California, Berkeley, Calif. 1997).
5. E. Tejnil, K. A. Goldberg, S. H. Lee, H. Medecki, P. J. Batson, P. E. Denham, A. A. MacDowell, J. Bokor, and D. Attwood, “At-wavelength interferometry for EUV lithography, ” J. Vac. Sci. Technol. B 15, 2455-2461 (1997).
6. P. Naulleau, K. A. Goldberg, S. Lee, C. Chang, D. Attwood, and J. Bokor, “Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subang strom reference-wave accuracy, ” Appl. Opt. 38, 7252-7263 (1999).
7. K. A. Goldberg, P. Naulleau, and J. Bokor, “EUV interferomet-ric measurements of diffraction-limited optics, ” J. Vac. Sci. Technol. B 17, 2982-2986 (1999).
8. E. Gullikson, S. Baker, J. Bjorkholm, J. Bokor, K. Goldberg, J. Goldsmith, C. Montcalm, P. Naulleau, E. Spiller, D. Stearns, J. Taylor, and J. Underwood, “EUV scattering and flare from 10 X projection cameras, ” in Emerging Lithographic Technologies III, Y. Vladimirski, ed., Proc. SPIE 3676, 717-723 (1999).
9. P. Naulleau, K. A. Goldberg, E. Gullikson, and J. Bokor, “In-terferometric at-wavelength flare characterization of EUV optical systems, ” J. Vac. Sci. Technol. B 17, 2987-2991 (1999).
10. E. M. Gullikson, “Scattering from normal incidence EUV optics, ” in Emerging Lithographic Technologies II, Y. Vladimirski, ed., Proc. SPIE 3331, 72-80 (1998).
11. W. Linnik, “A simple interferometer to test optical systems, ” Proc. Acad. Sci. USSR 1, 210-212 (1933).
12. R. N. Smartt and W. H. Steel, “Theory and application of point-diffraction interferometers, ” Jpn. J. Appl. Phys. 14, Suppl. 14-1, 351-356 (1975).
13. E. N. Leith and J. Upatnieks, “Reconstructed wavefronts and communication theory, ” J. Opt. Soc. Am. 52, 1123-1130 (1962).
14. E. N. Leith and J. Upatnieks, “Wavefronts reconstruction with diffused illumination and three-dimensional objects, ” J. Opt. Soc. Am. 54, 1295-1302 (1964).
15. P. Naulleau and K. A. Goldberg, “Dual-domain point diffraction interferometer, ” Appl. Opt. 38, 3523-3533 (1999).
16. D. A. Tichenor, G. D. Kubiak, M. E. Malinowski, R. H. Stulen, S. J. Haney, K. W. Berger, R. P. Nissen, R. L. Schmitt, G. A. Wilkerson, L. A. Brown, P. A. Spence, P. S. Jin, W. C. Sweat, W. W. Chow, J. E. Bjorkholm, R. R. Freeman, M. D. Himel, A. A. MacDowell, D. M. Tennant, O. R. Wood II, W. K. Waskiewicz, D. L. White, D. L. Windt, and T. E. Jewell, “Development and characterization of a 10 X Schwarzschild system for SXPL, ” in Soft X-Ray Projection Lithography, A. M. Hawryluk and R. H. Stulen, eds., Vol. 18 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1993), pp. 79-82.
17. R. Beguiristain, J. Underwood, M. Koike, P. Batson, E. Gul-likson, K. Jackson, H. Medecki, and D. Attwood, “High flux undulator beam line optics for EUV interferometry and photoemission microscopy, ” in High Heat Flux Engineering III, A. M. Khounsary, ed., Proc. SPIE 2855, 159-169 (1996).
18. D. Attwood, P. Naulleau, K. Goldberg, E. Tejnil, C. Chang, R. Beguiristain, P. Batson, J. Bokor, E. Gullikson, M. Koike, H. Medecki, and J. Underwood, “Tunable coherent radiation in the soft x-ray and extreme ultraviolet spectral regions, ” IEEE J. Quantum Electron. 35, 709-720 (1999).
19. K. A. Goldberg, P. Naulleau, R. Gaughan, H. Chapman, J. Goldsmith, and J. Bokor, “Direct comparison of EUV and visible-light interferometries, ” in Emerging Lithographic Technologies III, Y. Vladimirski, ed., Proc. SPIE 3676, 635-642 (1999).
20. J. Goldsmith, K. Berger, D. Bozman, G. Cardinale, D. Folk, C. Henderson, D. O’Connell, A. Ray-Chaudhuri, K. Stewart, D. Tichenor, H. Chapman, R. Gaughan, R. Hudyma, C. Montcalm, E. Spiller, J. Taylor, J. Williams, K. Goldberg, E. Gul-likson, P. Naulleau, and J. Cobb, “Sub-100-nm imaging with the EUV 10X microstepper, ” in Emerging Lithographic Technologies III, Y. Vladimirski, ed., Proc. SPIE 3676, 264-271 (1999).