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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 2956-2961

At-wavelength alignment and testing of the 0.3 NA MET optic

(7) Goldberg, Kenneth A a Naulleau, Patrick P a Denham, Paul E a Rekawa, Senajith B a Jackson, Keith a Anderson, Erik H a Liddle, J Alexander a

a LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET (EUV) INTERFEROMETRY; MICRO EXPOSURE TOOL (MET) OPTICS; NUMERICAL APERTURES (NA); ZERNIKE POLYNOMIAL SERIES;

ABERRATIONS; CAMERAS; CHARGE COUPLED DEVICES; DIFFRACTION; INTERFEROMETERS; INTERFEROMETRY; LITHOGRAPHY; MATHEMATICAL MODELS; MONITORING; OPTIMIZATION; PHASE SHIFT; PHOTORESISTS; POLYNOMIALS; WAVEFRONTS;

MICROOPTICS;

EID: 13244265984 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1815303 Document Type: Conference Paper

Times cited : (45)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.