-
1
-
-
0016116644
-
Design of ion-implanted MOSFETs with very small physical dimensions
-
May
-
R. H. Dennard, F. H. Gaensslen, H.-N. Yu, V. L. Rideout, E. Bassous, and A. R. Leblanc, "Design of ion-implanted MOSFETs with very small physical dimensions," IEEE J. Solid-State Circuits, vol. SC-9, pp. 256-268, May 1974.
-
(1974)
IEEE J. Solid-state Circuits
, vol.SC-9
, pp. 256-268
-
-
Dennard, R.H.1
Gaensslen, F.H.2
Yu, H.-N.3
Rideout, V.L.4
Bassous, E.5
Leblanc, A.R.6
-
2
-
-
0015725079
-
DC model for short-channel IGFETs
-
H. C. Poon, L. D. Yau, R. L. Johnston, and D. Beecham, "DC model for short-channel IGFETs," in IEDM Tech. Dig., 1974, pp. 156-159.
-
(1974)
IEDM Tech. Dig.
, pp. 156-159
-
-
Poon, H.C.1
Yau, L.D.2
Johnston, R.L.3
Beecham, D.4
-
3
-
-
0030871507
-
Scaling and reliability problems of gigabit CMOS circuits
-
H. Krautscheider, A. Kohlhase, and H. Terlezki, "Scaling and reliability problems of gigabit CMOS circuits," Microelectron. Reliabil., vol. 37, pp. 19-37, 1997.
-
(1997)
Microelectron. Reliabil.
, vol.37
, pp. 19-37
-
-
Krautscheider, H.1
Kohlhase, A.2
Terlezki, H.3
-
4
-
-
0017449653
-
Emission probability of hot electrons from silicon into silicon dioxide
-
T. H. Ning, C. M. Osburn, and H. N. Yu, "Emission probability of hot electrons from silicon into silicon dioxide," J. Appl. Phys., vol. 48, p. 286, 1997.
-
(1997)
J. Appl. Phys.
, vol.48
, pp. 286
-
-
Ning, T.H.1
Osburn, C.M.2
Yu, H.N.3
-
5
-
-
0018456839
-
Hot-electron emission in n-channel IGFETs
-
Apr.
-
R. W. Cottrel, R. R. Troutman, and T. H. Ning, "Hot-electron emission in n-channel IGFETs," IEEE Trans. Electron Devices, vol. 26, pp. 520-533, Apr. 1979.
-
(1979)
IEEE Trans. Electron Devices
, vol.26
, pp. 520-533
-
-
Cottrel, R.W.1
Troutman, R.R.2
Ning, T.H.3
-
6
-
-
0024755019
-
The physics of hot-electron degradation in Si MOSFETs: Can we understand it?
-
M. V. Fischetti, S. E. Laux, and D. J. DiMaria, "The physics of hot-electron degradation in Si MOSFETs: Can we understand it?," Appl. Surface Sci., vol. 39, p. 578, 1989.
-
(1989)
Appl. Surface Sci.
, vol.39
, pp. 578
-
-
Fischetti, M.V.1
Laux, S.E.2
Dimaria, D.J.3
-
7
-
-
0024753509
-
A cross-section of hot-carrier phenomena in MOS ULSIs
-
E. Takeda, "A cross-section of hot-carrier phenomena in MOS ULSIs," Appl. Surface Sci., vol. 39, p. 535, 1989.
-
(1989)
Appl. Surface Sci.
, vol.39
, pp. 535
-
-
Takeda, E.1
-
9
-
-
0001489212
-
Instabilities of metal-oxide-semiconductor transistor with high temperature annealing of its oxide in ammonia
-
H. Wong and Y. C. Cheng, "Instabilities of metal-oxide-semiconductor transistor with high temperature annealing of its oxide in ammonia," J. Appl. Phys., vol. 67, p. 7132, 1990.
-
(1990)
J. Appl. Phys.
, vol.67
, pp. 7132
-
-
Wong, H.1
Cheng, Y.C.2
-
10
-
-
84945713471
-
Hot-electron induced MOSFET degradation: Model, monitor and improvement
-
Feb.
-
C. Hu, S. C. Tam, F. C. Hsu, P. K. Ko, and T. Y. Chan, "Hot-electron induced MOSFET degradation: Model, monitor and improvement," IEEE Trans. Electron Devices, vol. 32, pp. 375-385, Feb. 1985.
-
(1985)
IEEE Trans. Electron Devices
, vol.32
, pp. 375-385
-
-
Hu, C.1
Tam, S.C.2
Hsu, F.C.3
Ko, P.K.4
Chan, T.Y.5
-
11
-
-
0020733451
-
An empirical model for device degradation due to hot-carrier injection
-
Apr.
-
E. Takeda and N. Suzuki, "An empirical model for device degradation due to hot-carrier injection," IEEE Trans. Electron Device Lett., vol. 4, pp. 111-113, Apr. 1983.
-
(1983)
IEEE Trans. Electron Device Lett.
, vol.4
, pp. 111-113
-
-
Takeda, E.1
Suzuki, N.2
-
12
-
-
0024124856
-
Consistent model for the hot-carrier degradation in n-channel and p-channel MOSFETs
-
Dec.
-
P. Heremans, R. Bellens, G. Groeseneken, and H. Maes, "Consistent model for the hot-carrier degradation in n-channel and p-channel MOSFETs," IEEE Trans. Electron Devices, vol. 35, pp. 2194-2209, Dec. 1988.
-
(1988)
IEEE Trans. Electron Devices
, vol.35
, pp. 2194-2209
-
-
Heremans, P.1
Bellens, R.2
Groeseneken, G.3
Maes, H.4
-
13
-
-
0027675554
-
Modeling of hot-carrier induced characteristics degradation of n-channel MOSFET
-
H. Wong and Y. C. Cheng, "Modeling of hot-carrier induced characteristics degradation of n-channel MOSFET," Solid-State Electron., vol. 36, pp. 1469-1475, 1993.
-
(1993)
Solid-state Electron.
, vol.36
, pp. 1469-1475
-
-
Wong, H.1
Cheng, Y.C.2
-
14
-
-
0000579237
-
Generation of interface states at the oxide/silicon interface due to hot electron injection
-
_, "Generation of interface states at the oxide/silicon interface due to hot electron injection," J. Appl. Phys., vol. 74, pp. 7364-7368, 1993.
-
(1993)
J. Appl. Phys.
, vol.74
, pp. 7364-7368
-
-
-
15
-
-
21544467967
-
Trap creation in silicon dioxide produced by hot electrons
-
D. J. DiMaria, "Trap creation in silicon dioxide produced by hot electrons," J. Appl. Phys., vol. 65, p. 2342, 1989.
-
(1989)
J. Appl. Phys.
, vol.65
, pp. 2342
-
-
Dimaria, D.J.1
-
16
-
-
0027678356
-
Berkeley reliability tools: BERT
-
Oct.
-
R. H. Tu, W. Y. Chan, C. C. Li, E. Minami, K. Quader, P. K. Ko, and C. Hu, "Berkeley reliability tools: BERT," IEEE Trans. Computer-Aided Design, vol. 12, pp. 1524-1534, Oct. 1993.
-
(1993)
IEEE Trans. Computer-aided Design
, vol.12
, pp. 1524-1534
-
-
Tu, R.H.1
Chan, W.Y.2
Li, C.C.3
Minami, E.4
Quader, K.5
Ko, P.K.6
Hu, C.7
-
18
-
-
0024612456
-
Short-channel effects in fully depleted SOI MOSFETs
-
Feb.
-
K. K. Young, "Short-channel effects in fully depleted SOI MOSFETs," IEEE Trans. Electron Devices, vol. 36, pp. 399-402, Feb. 1989.
-
(1989)
IEEE Trans. Electron Devices
, vol.36
, pp. 399-402
-
-
Young, K.K.1
-
19
-
-
0022321063
-
Charcteristics of submicrometer CMOS transistors in implanted-buried- oxide SOI films
-
K. Hashimoto, T. I. Kamins, K. M. Cham, and S. Y. Chiang, "Charcteristics of submicrometer CMOS transistors in implanted-buried-oxide SOI films," in IEDM Tech. Dig., 1985, pp. 672-675.
-
(1985)
IEDM Tech. Dig.
, pp. 672-675
-
-
Hashimoto, K.1
Kamins, T.I.2
Cham, K.M.3
Chiang, S.Y.4
-
20
-
-
84954092771
-
Analysis of p+ poly-Si double-gate thin-film SOI MOSFETs
-
T. Tanaka, H. Horie, S. Ando, and S. Hijiya, "Analysis of p+ poly-Si double-gate thin-film SOI MOSFETs," in IEDM Tech. Dig., 1991, pp. 683-686.
-
(1991)
IEDM Tech. Dig.
, pp. 683-686
-
-
Tanaka, T.1
Horie, H.2
Ando, S.3
Hijiya, S.4
-
21
-
-
84956267300
-
Silicon-on-insulator "gate-all-around" MOS device
-
J. P. Coolinge, M. H. Gao, A. Romano, H. Maes, and C. Claeys, "Silicon-on-insulator "gate-all-around" MOS device," in SOI Conf. Dig., 1990, pp. 137-138.
-
(1990)
SOI Conf. Dig.
, pp. 137-138
-
-
Coolinge, J.P.1
Gao, M.H.2
Romano, A.3
Maes, H.4
Claeys, C.5
-
22
-
-
0023421993
-
Doube-gate silicon-on-insulator transistor with volume inversion: A new device with greatly enhanced performance
-
Sept.
-
F. Balestra, S. Cristoloveanu, M. Menachir, J. Brini, and T. Elewa, "Doube-gate silicon-on-insulator transistor with volume inversion: A new device with greatly enhanced performance," IEEE Electron Device Lett., vol. 8, pp. 410-412, Sept. 1987.
-
(1987)
IEEE Electron Device Lett.
, vol.8
, pp. 410-412
-
-
Balestra, F.1
Cristoloveanu, S.2
Menachir, M.3
Brini, J.4
Elewa, T.5
-
23
-
-
0030241361
-
Deep submicrometer double-gate fully depleted SOI PMOS devices: A concise short-channel effect threshold voltage model using a quasi-2D approach
-
Sept.
-
S. S. Chen and J. B. Kuo, "Deep submicrometer double-gate fully depleted SOI PMOS devices: A concise short-channel effect threshold voltage model using a quasi-2D approach," IEEE Trans. Electron Devices, vol. 43, pp. 1387-1393, Sept. 1996.
-
(1996)
IEEE Trans. Electron Devices
, vol.43
, pp. 1387-1393
-
-
Chen, S.S.1
Kuo, J.B.2
-
24
-
-
0026896303
-
Scaling the Si MOSFET: From bulk to SOI to bulk
-
July
-
R. H. Yan, A. Ourmazd, and K. F. Lee, "Scaling the Si MOSFET: From bulk to SOI to bulk," IEEE Trans. Electron Device, vol. 39, pp. 1704-1710, July 1992.
-
(1992)
IEEE Trans. Electron Device
, vol.39
, pp. 1704-1710
-
-
Yan, R.H.1
Ourmazd, A.2
Lee, K.F.3
-
25
-
-
0023438606
-
Hot electron effects in silicon-on-insulator n-channel MOSFETs
-
J. P. Colinge, "Hot electron effects in silicon-on-insulator n-channel MOSFETs," IEEE Trans. Electron Devices, vol. 34, pp. 2173-2177, 1987.
-
(1987)
IEEE Trans. Electron Devices
, vol.34
, pp. 2173-2177
-
-
Colinge, J.P.1
-
26
-
-
0025401487
-
SOI design for competitive CMOS VLSI
-
Mar.
-
J. G. Fossum et al., "SOI design for competitive CMOS VLSI," IEEE Trans. Electron Devices, vol. 37, pp. 724-729, Mar. 1990.
-
(1990)
IEEE Trans. Electron Devices
, vol.37
, pp. 724-729
-
-
Fossum, J.G.1
-
27
-
-
0024870475
-
Half-micron CMOS on ultra-thin silicon-on-insulator
-
P. H. Woerlee et al., "Half-micron CMOS on ultra-thin silicon-on-insulator," in IEDM Tech Dig., 1989, pp. 821-824.
-
(1989)
IEDM Tech Dig.
, pp. 821-824
-
-
Woerlee, P.H.1
-
28
-
-
0025578859
-
A half micron CMOS technology using ultra-thin silicon on insulator
-
_, "A half micron CMOS technology using ultra-thin silicon on insulator," in IEDM Tech Dig., 1990, pp. 583-586.
-
(1990)
IEDM Tech Dig.
, pp. 583-586
-
-
-
29
-
-
0018455052
-
VLSI limitation from drain-induced barrier lowering
-
Apr.
-
R. R. Troutman, "VLSI limitation from drain-induced barrier lowering," IEEE Trans. Electron Devices, vol. ED-26, pp. 461-469, Apr. 1979.
-
(1979)
IEEE Trans. Electron Devices
, vol.ED-26
, pp. 461-469
-
-
Troutman, R.R.1
-
30
-
-
0031078092
-
A physical and scalable I-V model in BSIM3v3 for analog/digital circuit simulation
-
Feb.
-
Y. Cheng, M.-C. Jeng, Z. Liu, J. Huang, M. Chan, K. Chen, P. K. Ko, and C. Hu, "A physical and scalable I-V model in BSIM3v3 for analog/digital circuit simulation," IEEE Trans. Electron Devices, vol. 44, pp. 277-287, Feb. 1997.
-
(1997)
IEEE Trans. Electron Devices
, vol.44
, pp. 277-287
-
-
Cheng, Y.1
Jeng, M.-C.2
Liu, Z.3
Huang, J.4
Chan, M.5
Chen, K.6
Ko, P.K.7
Hu, C.8
-
31
-
-
0032070737
-
Three mechanisms determining short-channel effects in fully depleted SOI MOSFETs
-
May
-
T. Tsuchiya, Y. Sato, and M. Tomizawa, "Three mechanisms determining short-channel effects in fully depleted SOI MOSFETs," IEEE Trans. Electron Devices, vol. 45, pp. 1116-1121, May 1998.
-
(1998)
IEEE Trans. Electron Devices
, vol.45
, pp. 1116-1121
-
-
Tsuchiya, T.1
Sato, Y.2
Tomizawa, M.3
-
32
-
-
0034246461
-
Study of the extended P+ dual source structure for eliminating bipolar induced breakdown in submicron SOI MOSFETs
-
Aug.
-
V. Verma and M. J. Kumar, "Study of the extended P+ dual source structure for eliminating bipolar induced breakdown in submicron SOI MOSFETs," IEEE Trans. Electron Devices, vol. 47, pp. 1678-1680, Aug. 2000.
-
(2000)
IEEE Trans. Electron Devices
, vol.47
, pp. 1678-1680
-
-
Verma, V.1
Kumar, M.J.2
-
33
-
-
0036733286
-
Elimination of bipolar induced drain breakdown and single transistor latch in submicron PD SOI MOSFETs
-
Sept.
-
M. J. Kumar and V. Verma, "Elimination of bipolar induced drain breakdown and single transistor latch in submicron PD SOI MOSFETs," IEEE Trans. Reliabil., vol. 51, pp. 367-370, Sept. 2002.
-
(2002)
IEEE Trans. Reliabil.
, vol.51
, pp. 367-370
-
-
Kumar, M.J.1
Verma, V.2
-
34
-
-
0029406130
-
Threshold voltage model for deep-submicrometer fully depleted SOI MOSFETs
-
Nov.
-
S. R. Banna, P. C. H. Chan, P. K. Ko, C. T. Nguyen, and M. Chan, "Threshold voltage model for deep-submicrometer fully depleted SOI MOSFETs," IEEE Trans. Electron Devices, vol. 42, pp. 1949-55, Nov. 1995.
-
(1995)
IEEE Trans. Electron Devices
, vol.42
, pp. 1949-1955
-
-
Banna, S.R.1
Chan, P.C.H.2
Ko, P.K.3
Nguyen, C.T.4
Chan, M.5
-
35
-
-
0031628491
-
A 0.18 μm fully depleted CMOS on 30 nm thick SOI for sub-1.0 V operation
-
K. Imai, H. Onishi, K. Yamaguchi, K. Inoue, Y. Matsubara, A. Ono, and T. Horiuchi, "A 0.18 μm fully depleted CMOS on 30 nm thick SOI for sub-1.0 V operation," in Symp. VLSI Tech. Dig., 1998, pp. 116-117.
-
(1998)
Symp. VLSI Tech. Dig.
, pp. 116-117
-
-
Imai, K.1
Onishi, H.2
Yamaguchi, K.3
Inoue, K.4
Matsubara, Y.5
Ono, A.6
Horiuchi, T.7
-
36
-
-
0028499440
-
Deep-submicrometer channel design in silicon-on-insulator (SOI) MOSFET'
-
Sept.
-
L. T. Su, J. B. Jacobs, J. E. Chaung, and D. A. Antoniadis, "Deep-submicrometer channel design in silicon-on-insulator (SOI) MOSFET'," IEEE Electron Device Lett., vol. 15, pp. 366-369, Sept. 1994.
-
(1994)
IEEE Electron Device Lett.
, vol.15
, pp. 366-369
-
-
Su, L.T.1
Jacobs, J.B.2
Chaung, J.E.3
Antoniadis, D.A.4
-
37
-
-
0032595842
-
Threshold voltage dependence of LOCOS isolated thin-film SOI NMOSFET on buried oxide thickness
-
Sept.
-
J. W. Lee, H. K. Kim, M. R. Oh, and Y. H. Koh, "Threshold voltage dependence of LOCOS isolated thin-film SOI NMOSFET on buried oxide thickness," IEEE Electron Device Lett., vol. 20, pp. 478-480, Sept. 1999.
-
(1999)
IEEE Electron Device Lett.
, vol.20
, pp. 478-480
-
-
Lee, J.W.1
Kim, H.K.2
Oh, M.R.3
Koh, Y.H.4
-
38
-
-
84906703051
-
SOI devices for sub-0.1 μm gate lengths
-
J. P. Colinge, J. T. Park, and C. A. Colinge, "SOI devices for sub-0.1 μm gate lengths," in Proc. Int. Conf. Microelectronics (MIEL 2002), vol. 1, 2002, pp. 109-113.
-
(2002)
Proc. Int. Conf. Microelectronics (MIEL 2002)
, vol.1
, pp. 109-113
-
-
Colinge, J.P.1
Park, J.T.2
Colinge, C.A.3
-
39
-
-
0002228140
-
Ultra-thin-body SOI MOSFETs for terabit-scale integration
-
Dec.
-
B. Yu, Y. J. Tung, S. Tang, E. Hui, T.-J. King, and C. Hu, "Ultra-thin-body SOI MOSFETs for terabit-scale integration," in Proc. Int. Semiconductor Device Research Symp., Dec. 1997, pp. 623-626.
-
(1997)
Proc. Int. Semiconductor Device Research Symp.
, pp. 623-626
-
-
Yu, B.1
Tung, Y.J.2
Tang, S.3
Hui, E.4
King, T.-J.5
Hu, C.6
-
40
-
-
0033362286
-
A bulk-Si-compatible ultra-thin-body SOI technology for sub-100 nm MOSFETs
-
June
-
V. Subramanian, J. Kedzierski, N. Lindert, H. Tam, Y. Su, J. McHale, K. Cao, T.-J. King, J. Bokor, and C. Hu, "A bulk-Si-compatible ultra-thin-body SOI technology for sub-100 nm MOSFETs," in Proc. Device Research Conf., June 1999, pp. 28-29.
-
(1999)
Proc. Device Research Conf.
, pp. 28-29
-
-
Subramanian, V.1
Kedzierski, J.2
Lindert, N.3
Tam, H.4
Su, Y.5
McHale, J.6
Cao, K.7
King, T.-J.8
Bokor, J.9
Hu, C.10
-
41
-
-
0027813761
-
Three-dimensional atomistic simulation of discrete microscopic random dopant distributions effects in sub-0.1 μm MOSFETs
-
Dec.
-
H. S. Wong and Y. Taur, "Three-dimensional atomistic simulation of discrete microscopic random dopant distributions effects in sub-0.1 μm MOSFETs," in IEDM Tech. Dig., Dec. 1993, pp. 705-708.
-
(1993)
IEDM Tech. Dig.
, pp. 705-708
-
-
Wong, H.S.1
Taur, Y.2
-
42
-
-
0036474993
-
Design and fabrication of 50 nm thin-body p-MOSFETs with SiGe heterostructure channel
-
Feb.
-
Y. C. Yeo, V. Subramanian, J. Kedzierski, P. Xuan, T.-J. King, J. Bokor, and C. Hu, "Design and fabrication of 50 nm thin-body p-MOSFETs with SiGe heterostructure channel," IEEE Trans. Electron Devices, vol. 49, pp. 279-286, Feb. 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, pp. 279-286
-
-
Yeo, Y.C.1
Subramanian, V.2
Kedzierski, J.3
Xuan, P.4
King, T.-J.5
Bokor, J.6
Hu, C.7
-
43
-
-
0033656171
-
30 nm ultra-thin-body SOI MOSFET with selectively deposited Ge raised S-D
-
Denver, CO, June
-
Y. K. Choi, Y.-C. Jeon, P. Ranade, H. Takeuchi, T.-J. King, J. Bokor, and C. Hu, "30 nm ultra-thin-body SOI MOSFET with selectively deposited Ge raised S-D," in Proc. Device Res. Conf., Denver, CO, June 2000, pp. 23-24.
-
(2000)
Proc. Device Res. Conf.
, pp. 23-24
-
-
Choi, Y.K.1
Jeon, Y.-C.2
Ranade, P.3
Takeuchi, H.4
King, T.-J.5
Bokor, J.6
Hu, C.7
-
44
-
-
0033750493
-
Ultra-thin-body SOI MOSFET for deep-sub-tenth micron era
-
May
-
Y. K. Choi, K. Asano, N. Lindert, V. Subramanium, T.-J. King, J. Bokor, and C. Hu, "Ultra-thin-body SOI MOSFET for deep-sub-tenth micron era," IEEE Electron Device Lett., vol. 21, pp. 254-256, May 2000.
-
(2000)
IEEE Electron Device Lett.
, vol.21
, pp. 254-256
-
-
Choi, Y.K.1
Asano, K.2
Lindert, N.3
Subramanium, V.4
King, T.-J.5
Bokor, J.6
Hu, C.7
-
45
-
-
0035167227
-
Design analysis of thin-body silicide source/drain devices
-
J. Kedzierski, M. Ieong, P. Xuan, J. Bokor, T. J. King, and C. Hu, "Design analysis of thin-body silicide source/drain devices," in Proc. IEEE Int. SOI Conf., 2001, pp. 21-22.
-
(2001)
Proc. IEEE Int. SOI Conf.
, pp. 21-22
-
-
Kedzierski, J.1
Ieong, M.2
Xuan, P.3
Bokor, J.4
King, T.J.5
Hu, C.6
-
46
-
-
2342541281
-
Low Schottky barrier source/drain for advanced MOS architecture: Device design and material considerations
-
Grenoble, France, Jan.
-
E. Dubois and G. Larrieu, "Low Schottky barrier source/drain for advanced MOS architecture: Device design and material considerations," in Proc. ULIS'2001 Workshop, Grenoble, France, Jan. 2001, p. 53.
-
(2001)
Proc. ULIS'2001 Workshop
, pp. 53
-
-
Dubois, E.1
Larrieu, G.2
-
48
-
-
0031236185
-
Reliable Tantalum-gate fully depleted SOI MOSFET technology featuring low-temperature processing
-
Sept.
-
T. Ushiki, M. C. Yu, Y. Hirano, H. Shimada, M. Morita, and T. Ohmi, "Reliable Tantalum-gate fully depleted SOI MOSFET technology featuring low-temperature processing," IEEE Trans. Electron Devices, vol. 44, pp. 1467-1472, Sept. 1997.
-
(1997)
IEEE Trans. Electron Devices
, vol.44
, pp. 1467-1472
-
-
Ushiki, T.1
Yu, M.C.2
Hirano, Y.3
Shimada, H.4
Morita, M.5
Ohmi, T.6
-
49
-
-
0035158946
-
Metal gates for advanced sub-80-nm SOI CMOS technology
-
B. Cheng et al., "Metal gates for advanced sub-80-nm SOI CMOS technology," in Proc. IEEE Int. SOI Conf., 2001, pp. 90-91.
-
(2001)
Proc. IEEE Int. SOI Conf.
, pp. 90-91
-
-
Cheng, B.1
-
50
-
-
0036454454
-
Scaling assessment of fully depleted SOI technology at the 30 nm gate length generation
-
A. Vandoorem et al., "Scaling assessment of fully depleted SOI technology at the 30 nm gate length generation," in Proc. IEEE Int. SOI Conf., 2002, pp. 25-27.
-
(2002)
Proc. IEEE Int. SOI Conf.
, pp. 25-27
-
-
Vandoorem, A.1
-
51
-
-
0032625315
-
Analytical threshold voltage model for ultra-thin SOI MOSFETs including short-channel and floating body effects
-
Apr.
-
A. O. Adam, K. Higashi, and Y. Fukushima, "Analytical threshold voltage model for ultra-thin SOI MOSFETs including short-channel and floating body effects," IEEE Trans. Electron Devices, vol. 46, pp. 729-737, Apr. 1999.
-
(1999)
IEEE Trans. Electron Devices
, vol.46
, pp. 729-737
-
-
Adam, A.O.1
Higashi, K.2
Fukushima, Y.3
-
52
-
-
0036454484
-
Influence of HALO implantation on analog performance and comparison between bulk, partially depleted and fully depleted MOSFETs
-
L. Vancaille et al., "Influence of HALO implantation on analog performance and comparison between bulk, partially depleted and fully depleted MOSFETs," in Proc. IEEE Int. SOI Conf., 2002, pp. 161-163.
-
(2002)
Proc. IEEE Int. SOI Conf.
, pp. 161-163
-
-
Vancaille, L.1
-
53
-
-
0032256253
-
25 nm CMOS design considerations
-
Y. Taur et al., "25 nm CMOS design considerations," in IEDM Tech. Dig., 1998, pp. 789-792.
-
(1998)
IEDM Tech. Dig.
, pp. 789-792
-
-
Taur, Y.1
-
54
-
-
0031120671
-
Potential design and transport property of 0.1-μm MOSFET with asymmetric channel profile
-
Apr.
-
S. Odanaka and A. Hiroki, "Potential design and transport property of 0.1-μm MOSFET with asymmetric channel profile," IEEE Trans. Electron Devices, vol. 44, pp. 595-600, Apr. 1997.
-
(1997)
IEEE Trans. Electron Devices
, vol.44
, pp. 595-600
-
-
Odanaka, S.1
Hiroki, A.2
-
55
-
-
84908155589
-
Realization of sub 100 nm asymmetric channel MOSFETs with excellent short-channel performance and reliability
-
Bordeaux, France
-
B. Cheng, V. R. Rao, B. Ikegami, and J. C. S. Woo, "Realization of sub 100 nm asymmetric channel MOSFETs with excellent short-channel performance and reliability," in Proc. 28th Eur. Solid-State Device Research Conf. (ESSDERC), Bordeaux, France, 1998, pp. 520-523.
-
(1998)
Proc. 28th Eur. Solid-State Device Research Conf. (ESSDERC)
, pp. 520-523
-
-
Cheng, B.1
Rao, V.R.2
Ikegami, B.3
Woo, J.C.S.4
-
56
-
-
0032313799
-
Sub 0.18 μm SOI MOSFETs using lateral asymmetric channel profile and Ge pre-amorphization salicide technology
-
B. Cheng, V. R. Rao, and J. C. S. Woo, "Sub 0.18 μm SOI MOSFETs using lateral asymmetric channel profile and Ge pre-amorphization salicide technology," in Proc. IEEE Int. SOI Conf., 1998, pp. 113-114.
-
(1998)
Proc. IEEE Int. SOI Conf.
, pp. 113-114
-
-
Cheng, B.1
Rao, V.R.2
Woo, J.C.S.3
-
57
-
-
0033281303
-
Channel engineering for high speed sub-1.0 V power supply deep sub-micron CMOS, Technical digest
-
B. Cheng, A. Inani, V. R. Rao, and J. C. S. Woo, "Channel engineering for high speed sub-1.0 V power supply deep sub-micron CMOS, Technical digest," in Proc. Symp. VLSI Technology, 1999, pp. 69-70.
-
(1999)
Proc. Symp. VLSI Technology
, pp. 69-70
-
-
Cheng, B.1
Inani, A.2
Rao, V.R.3
Woo, J.C.S.4
-
58
-
-
84941364954
-
Small signal characteristics of thin film single halo SOI MOSFET for mixed mode applications
-
N. Hakim, V. R. Rao, and J. Vasi, "Small signal characteristics of thin film single halo SOI MOSFET for mixed mode applications," in Proc. 16th Int. Conf. VLSI Design, 2003, pp. 110-115.
-
(2003)
Proc. 16th Int. Conf. VLSI Design
, pp. 110-115
-
-
Hakim, N.1
Rao, V.R.2
Vasi, J.3
-
59
-
-
84966680916
-
Characterization of lateral asymmetric channel (LAC) thin film SOI MOSFET
-
N. Hakim, M.V. Dunga, A. Kumar, V.R. Rao, and J. Vasi, "Characterization of lateral asymmetric channel (LAC) thin film SOI MOSFET," in Proc. 6th Int. Conf. Solid State and Integrated Circuit Technology (ICSICT), 2001, pp. 655-660.
-
(2001)
Proc. 6th Int. Conf. Solid State and Integrated Circuit Technology (ICSICT)
, pp. 655-660
-
-
Hakim, N.1
Dunga, M.V.2
Kumar, A.3
Rao, V.R.4
Vasi, J.5
-
60
-
-
0036541362
-
Analysis of floating body effects in thin film conventional and single pocket SOI MOSFETs using the GIDL current technique
-
Apr.
-
N. Hakim, M. V. Dunga, A. Kumar, J. Vasi, V. R. Rao, B. Cheng, and J. C.S. Woo, "Analysis of floating body effects in thin film conventional and single pocket SOI MOSFETs using the GIDL current technique," IEEE Electron Device Lett., vol. 23, pp. 209-211, Apr. 2002.
-
(2002)
IEEE Electron Device Lett.
, vol.23
, pp. 209-211
-
-
Hakim, N.1
Dunga, M.V.2
Kumar, A.3
Vasi, J.4
Rao, V.R.5
Cheng, B.6
Woo, J.C.S.7
-
61
-
-
0003639084
-
The ground-plane concept for the reduction of short-channel effects in fully depleted SOI devices
-
T. Ernst and S. Cristoloveanu, "The ground-plane concept for the reduction of short-channel effects in fully depleted SOI devices," Electrochem. Soc. Proc., pp. 329-334, 1999.
-
(1999)
Electrochem. Soc. Proc.
, pp. 329-334
-
-
Ernst, T.1
Cristoloveanu, S.2
-
62
-
-
0032284102
-
Device design considerations for double-gate, ground-plane, and single-gated ultra-thin SOI MOSFETs at the 25 nm channel length generation
-
H. S. P. Wong, D. J. Frank, and P. M. Solomon, "Device design considerations for double-gate, ground-plane, and single-gated ultra-thin SOI MOSFETs at the 25 nm channel length generation," in IEDM Tech. Dig., 1998, pp. 407-410.
-
(1998)
IEDM Tech. Dig.
, pp. 407-410
-
-
Wong, H.S.P.1
Frank, D.J.2
Solomon, P.M.3
-
63
-
-
0242327680
-
Silicon-on-insulator (SOI) MOSFET structure for sub-50-nm channel regime
-
S. Cristoloveanu, P. L. F. Hemment, K. Izumi, G. K. Celler, F. Assaderaghi, and Y. W. Kim, Eds., Electrochemical Society Proceedings
-
Y. Omura, "Silicon-on-insulator (SOI) MOSFET structure for sub-50-nm channel regime," in Silicon-on-Insulator Technology and Devices X, S. Cristoloveanu, P. L. F. Hemment, K. Izumi, G. K. Celler, F. Assaderaghi, and Y. W. Kim, Eds., 2001, vol. 2001-3, Electrochemical Society Proceedings, pp. 205-210.
-
(2001)
Silicon-on-insulator Technology and Devices X
, vol.2003
, pp. 205-210
-
-
Omura, Y.1
-
64
-
-
0033336434
-
Self-aligned implanted ground-plane fully depleted SOI MOSFET
-
W. Xiong and J. P. Colinge, "Self-aligned implanted ground-plane fully depleted SOI MOSFET," Electron. Lett., vol. 35, no. 23, pp. 2059-60, 1999.
-
(1999)
Electron. Lett.
, vol.35
, Issue.23
, pp. 2059-2060
-
-
Xiong, W.1
Colinge, J.P.2
-
65
-
-
0029754323
-
A silicon-on-insulator quantum wire
-
J. P. Colinge, X. Baie, V. Bayot, and E. Grivei, "A silicon-on-insulator quantum wire," Solid-State Electron., vol. 39, no. 1, pp. 49-51, 1996.
-
(1996)
Solid-state Electron.
, vol.39
, Issue.1
, pp. 49-51
-
-
Colinge, J.P.1
Baie, X.2
Bayot, V.3
Grivei, E.4
-
66
-
-
0033329310
-
Sub 50-nm FinFET: PMOS
-
X. Huang, W. C. Lee, C. Kuo, D. Hisamoto, L. Chang, J. Kedzierski, E. Anderson, H. Takeuchi, Y. K. Choi, K. Asano, V. Subramanian, T. J. King, J. Bokor, and C. Hu, "Sub 50-nm FinFET: PMOS," in IEDM Tech. Dig., 1999, pp. 67-70.
-
(1999)
IEDM Tech. Dig.
, pp. 67-70
-
-
Huang, X.1
Lee, W.C.2
Kuo, C.3
Hisamoto, D.4
Chang, L.5
Kedzierski, J.6
Anderson, E.7
Takeuchi, H.8
Choi, Y.K.9
Asano, K.10
Subramanian, V.11
King, T.J.12
Bokor, J.13
Hu, C.14
-
67
-
-
0013446050
-
A fully depleted Δ-channel SOI nMOSFET
-
Z. Jiao and C. A. T. Salama, "A fully depleted Δ-channel SOI nMOSFET," Electrochem. Soc. Proc., pp. 403-408, 2001.
-
(2001)
Electrochem. Soc. Proc.
, pp. 403-408
-
-
Jiao, Z.1
Salama, C.A.T.2
-
68
-
-
0024918341
-
A fully depleted lean-channel transistor (DELTA) - A novel vertical ultra thin SOI MOSFET
-
D. Hisamoto, T. Kaga, Y. Kawamoto, and E. Takeda, "A fully depleted lean-channel transistor (DELTA) - A novel vertical ultra thin SOI MOSFET," in IEDM Tech, Dig., 1989, p. 833.
-
(1989)
IEDM Tech, Dig.
, pp. 833
-
-
Hisamoto, D.1
Kaga, T.2
Kawamoto, Y.3
Takeda, E.4
-
69
-
-
0035164007
-
Nano-scale silicon MOSFET: Toward nontraditional and quantum devices
-
T. Hiramoto, "Nano-scale silicon MOSFET: Toward nontraditional and quantum devices," in Proc. IEEE Int. SOI Conf., 2001, pp. 8-10.
-
(2001)
Proc. IEEE Int. SOI Conf.
, pp. 8-10
-
-
Hiramoto, T.1
-
70
-
-
0032205525
-
A simple model for threshold voltage of surrounding-gate MOSFETs
-
Nov.
-
C. P. Auth and J. D. Plummer, "A simple model for threshold voltage of surrounding-gate MOSFETs," IEEE Trans. Electron Devices, vol. 45, pp. 2381-2383, Nov. 1998.
-
(1998)
IEEE Trans. Electron Devices
, vol.45
, pp. 2381-2383
-
-
Auth, C.P.1
Plummer, J.D.2
-
71
-
-
0026909715
-
Numerical analysis of a cylindrical thin-pillar transistor (CYNTHIA)
-
Aug.
-
S. Miyano, M. Hirose, and F. Masuoka, "Numerical analysis of a cylindrical thin-pillar transistor (CYNTHIA)," IEEE Trans. Electron Devices, vol. 39, pp. 1876-1881, Aug. 1992.
-
(1992)
IEEE Trans. Electron Devices
, vol.39
, pp. 1876-1881
-
-
Miyano, S.1
Hirose, M.2
Masuoka, F.3
-
72
-
-
0035159965
-
Comparison of Gate structures for short-channel SOI MOSFETs
-
J. T. Park, C. A. Coolinge, and J. P. Coolinge, "Comparison of Gate structures for short-channel SOI MOSFETs," in Proc. IEEE Int. SOI Conf., 2001, pp. 115-116.
-
(2001)
Proc. IEEE Int. SOI Conf.
, pp. 115-116
-
-
Park, J.T.1
Coolinge, C.A.2
Coolinge, J.P.3
-
73
-
-
6344290643
-
Calculated threshold voltage characteristics of an XMOS transistor having an additional bottom gate
-
T. Sekigawa and Y. Hayashi, "Calculated threshold voltage characteristics of an XMOS transistor having an additional bottom gate," Solid-State Electron., vol. 27, no. 8-9, pp. 827-828, 1984.
-
(1984)
Solid-state Electron.
, vol.27
, Issue.8-9
, pp. 827-828
-
-
Sekigawa, T.1
Hayashi, Y.2
-
74
-
-
0032041556
-
Two-dimensional confinement effects in gate-all-around (GAA) MOSFETs
-
Apr.
-
X. Baie and J. P. Colinge, "Two-dimensional confinement effects in gate-all-around (GAA) MOSFETs," Solid-State Electron., vol. 42, pp. 499-504, Apr. 1998.
-
(1998)
Solid-state Electron.
, vol.42
, pp. 499-504
-
-
Baie, X.1
Colinge, J.P.2
-
75
-
-
0034472898
-
Newplanar selfaligned double-gate fully depleted P-MOSFETs using epitaxial lateral over-growth (ELO) and selectively grown source/drain (S/D)
-
T. Su, J. P. Denton, and G. W. Neudeck, "Newplanar selfaligned double-gate fully depleted P-MOSFETs using epitaxial lateral over-growth (ELO) and selectively grown source/drain (S/D)," in Proc. IEEE Int. SOI Conf., 2000, pp. 110-111.
-
(2000)
Proc. IEEE Int. SOI Conf.
, pp. 110-111
-
-
Su, T.1
Denton, J.P.2
Neudeck, G.W.3
-
76
-
-
0035475617
-
Sub-60-nm quasi-planar FinFETs fabricated using a simplified process
-
Oct.
-
N. Lindert, L. Chang, Y.-K. Cho, E. H. Anderson, W.-C. Lee, T.-J. King, J. Bokor, and C.-M. Hu, "Sub-60-nm quasi-planar FinFETs fabricated using a simplified process," IEEE Electron Device Lett., vol. 22, pp. 487-489, Oct. 2001.
-
(2001)
IEEE Electron Device Lett.
, vol.22
, pp. 487-489
-
-
Lindert, N.1
Chang, L.2
Cho, Y.-K.3
Anderson, E.H.4
Lee, W.-C.5
King, T.-J.6
Bokor, J.7
Hu, C.-M.8
-
77
-
-
0032670723
-
Dual material gate (DMG) field effect transistor
-
May
-
W. Long, H. Ou, J.-M. Kuo, and K. K. Chin, "Dual material gate (DMG) field effect transistor," IEEE Trans. Electron Devices, vol. 46, pp. 865-870, May 1999.
-
(1999)
IEEE Trans. Electron Devices
, vol.46
, pp. 865-870
-
-
Long, W.1
Ou, H.2
Kuo, J.-M.3
Chin, K.K.4
-
78
-
-
1942423745
-
Two-dimensional analytical modeling of fully depleted dual-material gate (DMG) SOI MOSFET and evidence for diminished short-channel effects
-
Apr.
-
M. J. Kumar and A. Chaudhry, "Two-dimensional analytical modeling of fully depleted dual-material gate (DMG) SOI MOSFET and evidence for diminished short-channel effects," IEEE Trans. Electron Devices, vol. 51, pp. 569-574, Apr. 2004.
-
(2004)
IEEE Trans. Electron Devices
, vol.51
, pp. 569-574
-
-
Kumar, M.J.1
Chaudhry, A.2
-
79
-
-
1942485694
-
-
Technology Modeling Associates Inc., Palo Alto, CA
-
MEDICI 4.0, Technology Modeling Associates Inc., Palo Alto, CA, 1997.
-
(1997)
MEDICI 4.0
-
-
-
80
-
-
0033888854
-
Exploring the novel characteristics of hetero-material gate field-effect transistors (HMGFETs) with gate-material engineering
-
Jan.
-
X. Zhou, "Exploring the novel characteristics of hetero-material gate field-effect transistors (HMGFETs) with gate-material engineering," IEEE Trans. Electron Devices, vol. 47, pp. 113-120, Jan. 2000.
-
(2000)
IEEE Trans. Electron Devices
, vol.47
, pp. 113-120
-
-
Zhou, X.1
|