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Volumn 48, Issue 1, 1977, Pages 286-293

Emission probability of hot electrons from silicon into silicon dioxide

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICES - SEMICONDUCTOR INSULATOR BOUNDARIES; TRANSISTORS, FIELD EFFECT;

EID: 0017449653     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.323374     Document Type: Article
Times cited : (219)

References (25)
  • 12
    • 84950790510 scopus 로고    scopus 로고
    • Doping profiles of the boron‐implanted devices were measured by pulsed capacitance‐voltage technique.
  • 15
    • 84950901282 scopus 로고    scopus 로고
    • Boron depletion effect was estimated by computer simulation using a program developed by F. F. Morehead of IBM.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.