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Volumn 149, Issue 1, 2002, Pages 32-39

Low frequency and 1/f noise in wide-gap semiconductors: Silicon carbide and gallium nitride

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY GAP; FIELD EFFECT TRANSISTORS; FREQUENCIES; GALLIUM NITRIDE; HETEROJUNCTIONS; OPTICAL COMMUNICATION; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; SPURIOUS SIGNAL NOISE;

EID: 0036477580     PISSN: 13502409     EISSN: None     Source Type: Journal    
DOI: 10.1049/ip-cds:20020328     Document Type: Conference Paper
Times cited : (27)

References (69)
  • 5
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    • Volume and temperature dependence of the 1/f noise parameter alpha in Si
    • (1989) Physica B , vol.154 , Issue.2 , pp. 214-224
    • Clevers, R.H.1
  • 30
    • 0001350590 scopus 로고    scopus 로고
    • Bulk noise processes and their correlation to structural imperfections in magnesium-doped p-type GaN grown on sapphire
    • (2000) J. Appl. Phys. , vol.87 , Issue.11 , pp. 7892-7895
    • Rice, A.K.1    Malloy, K.J.2
  • 50
    • 0009099695 scopus 로고
    • 1/f noise from levels in a linear or planar array. IV. The origin of the Hooge parameter
    • (1992) J. Appl. Phys. , vol.72 , Issue.9 , pp. 4113-4117
    • Morrison, S.R.1
  • 61
    • 0033732350 scopus 로고    scopus 로고
    • Gate-voltage dependence of low-frequency noise in GaN/AlGaN heterostructure field-effect transistors
    • (2000) Electron. Lett. , vol.36 , Issue.10 , pp. 912-913
    • Balandin, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.