Directed self-assembly of block copolymers for nanocircuitry fabrication

Microelectronic Engineering

Volumn 132, Issue , 2015, Pages 207-217

  Morris, M A ^a,b  

^a TRINITY COLLEGE DUBLIN   (Ireland)

^b UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

Block copolymer lithography; Chemical epitaxy; Defectivity; Pattern transfer; Physical epitaxy; Process flows

Indexed keywords

EPITAXIAL GROWTH; FABRICATION; INTEGRATED CIRCUITS; SELF ASSEMBLY;

BLOCK COPOLYMER FILMS; BLOCK COPOLYMER LITHOGRAPHY; DEFECTIVITY; DIRECTED SELF-ASSEMBLY; LONG RANGE ORDERS; PATTERN TRANSFERS; PROCESS FLOWS; SELF ASSEMBLY PROCESS;

BLOCK COPOLYMERS;

EID: 84912101584     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2014.08.009     Document Type: Review

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