Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-Assembly of PS-b-PDMS

European Polymer Journal

Volumn 49, Issue 11, 2013, Pages 3512-3521

  Borah, Dipu ^a,b,c   Simao, Claudia D ^d   Senthamaraikannan, Ramsankar ^a,c   Rasappa, Sozaraj ^a,b,c   Francone, Achille ^d   Lorret, Olivier ^e   Salaun, Mathieu ^f   Kosmala, Barbara ^a,b   Kehagias, Nikolaos ^d   Zelsmann, Marc ^f   Sotomayor Torres, Clivia M ^d,g   Morris, Michael A ^a,b,c  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b UNIVERSITY COLLEGE CORK   (Ireland)

^c TRINITY COLLEGE DUBLIN   (Ireland)

^d CATALAN INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY ICN2   (Spain)

^e Profactor GmbH   (Australia)

^f Laboratoire Interdisciplinaire de Physique   (France)

^g INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS ICREA   (Spain)

Author keywords

Block copolymer Polyhedral oligomeric silsesquioxanes; Directed self Assembly; Graphoepitaxy; Nanoimprint lithography; Surface chemistry

Indexed keywords

ALIGNMENT AND ORIENTATIONS; DIRECTED SELF-ASSEMBLY; GRAPHOEPITAXY; HEXAGONAL STRUCTURES; INTERCONNECT STRUCTURES; PATTERNED SUBSTRATES; POLYHEDRAL OLIGOMERIC SILSESQUIOXANES; SILSESQUIOXANES;

BLOCK COPOLYMERS; CYLINDERS (SHAPES); MICROCHANNELS; NANOIMPRINT LITHOGRAPHY; OLIGOMERS; ORGANIC SOLVENTS; SELF ASSEMBLY; SILICONES; SURFACE CHEMISTRY;

SUBSTRATES;

EID: 84885020807     PISSN: 00143057     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.eurpolymj.2013.08.011     Document Type: Article

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