Order quantification of hexagonal periodic arrays fabricated by in situ solvent-assisted nanoimprint lithography of block copolymers

Nanotechnology

Volumn 25, Issue 17, 2014, Pages

  Simão, Claudia ^a   Khunsin, Worawut ^a,f   Kehagias, Nikolaos ^a   Salaun, Mathieu ^b   Zelsmann, Marc ^b   Morris, Michael A ^c,d   Sotomayor Torres, Clivia M ^a,e  

^a CATALAN INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY ICN2   (Spain)

^b Laboratoire Interdisciplinaire de Physique   (France)

^c UNIVERSITY COLLEGE CORK   (Ireland)

^d TRINITY COLLEGE DUBLIN   (Ireland)

^e INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS ICREA   (Spain)

^f HOKKAIDO UNIVERSITY   (Japan)

Author keywords

block copolymers; directed self assembly; GISAXS; nanoimprint lithography; nanometrology

Indexed keywords

BLOCK COPOLYMERS; NANOSTRUCTURED MATERIALS; POLYETHYLENE OXIDES; SELF ASSEMBLY; SILICON WAFERS; SOLVENTS; THIN FILMS; VAPORS;

BLOCK COPOLYMER FILMS; DIRECTED SELF-ASSEMBLY; GI-SAXS; GRAZING INCIDENCE SMALL-ANGLE X-RAY SCATTERING; LARGE SURFACE AREA; NANOMETROLOGY; PATTERN REPLICATION; SURFACE PRE-TREATMENTS;

NANOIMPRINT LITHOGRAPHY;

MACROGOL DERIVATIVE; NANOMATERIAL; POLYSTYRENE DERIVATIVE; POLYSTYRENE-B-POLY(ETHYLENE OXIDE);

CHEMISTRY; ULTRASTRUCTURE; X RAY DIFFRACTION;

NANOSTRUCTURES; POLYETHYLENE GLYCOLS; POLYSTYRENES; X-RAY DIFFRACTION;

EID: 84898634009     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/25/17/175703     Document Type: Article

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