Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems

Langmuir

Volumn 29, Issue 9, 2013, Pages 2809-2820

  Borah, Dipu ^a,b,c   Ozmen, Mustafa ^d   Rasappa, Sozaraj ^a,b   Shaw, Matthew T ^a,b,c,e   Holmes, Justin D ^a,b,c   Morris, Michael A ^a,b,c  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b TRINITY COLLEGE DUBLIN   (Ireland)

^c UNIVERSITY COLLEGE CORK   (Ireland)

^d SELCUK UNIVERSITY   (Turkey)

^e Intel Ireland Ltd   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

DOMAIN ORIENTATION; FUNCTIONALIZED; MOLECULAR APPROACH; NANOSCALE FEATURES; NANOSTRUCTURED SURFACE; ORIENTATION CONTROL; PRECISE CONTROL; RANDOM COPOLYMER; SILICON SUBSTRATES; SURFACE FUNCTIONALIZATION;

ETHYLENE GLYCOL; MICROCHANNELS; MICROPHASE SEPARATION; SURFACE CHEMISTRY; THIN FILMS;

BLOCK COPOLYMERS;

EID: 84874584704     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la304140q     Document Type: Article

References (52)

1. Lazzari, M.; Lopez-Quintela, M. A. Block copolymers as a tool for nanomaterial fabrication Adv. Mater. 2003, 15, 1583-1594
2. 2 and beyond ACS Nano 2009, 3, 1844-1858
3. Xiao, S.; Yang, X. M.; Edwards, E. W.; La, Y.-H.; Nealey, P. F. Graphoepitaxy of cylinder-forming block copolymers for use as templates to pattern magnetic metal dot arrays Nanotechnology 2005, 16, S324-S329
4. Shin, K.; Leach, K. A.; Goldbach, J. T.; Kim, D. H.; Jho, J. Y.; Tuominen, M.; Hawker, C. J.; Russell, T. P. A simple route to metal nanodots and nanoporous metal films Nano Lett. 2002, 2, 933-936
5. Thurn-Albrecht, T.; Schotter, J.; Kastle, G. A.; Emley, N.; Shibauchi, T.; Krusin-Elbaum, L.; Guarini, K. W.; Black, C. T.; Tuominen, M. T.; Russell, T. P. Ultrahigh-density nanowire arrays grown in self-assembled diblock copolymer templates Science 2000, 290, 2126-2129
6. Hobbs, R. G.; Farrell, R. A.; Bolger, C. T.; Kelly, R. A.; Morris, M. A.; Petkov, N.; Holmes, J. D. Selective sidewall wetting of polymer blocks in hydrogen silsesquioxane directed self-assembly of PS- b -PDMS ACS Appl. Mater. Interfaces 2012, 4, 4637-4642
7. Jung, Y. S.; Chang, J. B.; Verploegen, E.; Berggren, K. K.; Ross, C. A. A path to ultranarrow patterns using self-assembled lithography Nano Lett. 2010, 10, 1000-1005
8. Jung, Y. S.; Ross, C. A. Solvent-vapor-induced tunability of self-assembled block copolymer patterns Adv. Mater. 2009, 21, 2540-2545
9. Jung, Y. S.; Ross, C. A. Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer Nano Lett. 2007, 7, 2046-2050
10. Glagola, C. P.; Miceli, L. M.; Milchak, M. A.; Halle, E. H.; Logan, J. L. Polystyrene-poly(ethylene oxide) diblock copolymer: the effect of polystyrene and spreading concentration at the air/water interface Langmuir 2012, 28, 5048-5058
11. Ghoshal, T.; Maity, T.; Godsell, J. F.; Roy, S.; Morris, M. A. Large scale monodisperse hexagonal arrays of superparamagnetic iron oxides nanodots: a facile block copolymer inclusion method Adv. Mater. 2012, 24, 2390-2397
12. Aissou, K.; Fleury, G.; Pecastaings, G.; Alnasser, T.; Mornet, S.; Goglio, G.; Hadziioannou, G. Hexagonal-to-cubic phase transformation in composite thin films induced by FePt nanoparticles located at PS/PEO interfaces Langmuir 2011, 27, 14481-14488
13. Olayo-Valles, R.; Guo, S. W.; Lund, M. S.; Leighton, C.; Hillmyer, M. A. Perpendicular domain orientation in thin films of polystyrene-polylactide diblock copolymers Macromolecules 2005, 38, 10101-10108
14. Zalusky, A. S.; Olayo-Valles, R.; Wolf, J. H.; Hillmyer, M. A. Ordered nanoporous polymers from polystyrene-polylactide block copolymers J. Am. Chem. Soc. 2002, 124, 12761-12773
15. Black, C. T.; Guarini, K. W.; Milkove, K. R.; Baker, S. M.; Russell, T. P.; Tuominen, M. T. Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication Appl. Phys. Lett. 2001, 79, 409-411
16. Liu, K.; Baker, S. M.; Tuominen, M.; Russell, T. P.; Schuller, I. K. Tailoring exchange bias with magnetic nanostructures Phys. Rev. B 2001, 63, 060403(R)
17. Montero, M. I.; Liu, K.; Stoll, O. M.; Hoffmann, A.; Akermann, J. J.; Martin, J. I.; Vicent, J. L.; Baker, S. M.; Russell, T. P.; Leighton, C.; Nogues, J.; Schuller, I. K. Nanostructures and the proximity effect J. Phys. D: Appl. Phys. 2002, 35, 2398-2402
18. Haensch, C.; Hoeppener, S.; Schubert, U. S. Chemical modification of self-assembled silane based monolayers by surface reactions Chem. Soc. Rev. 2010, 39, 2323-2334
19. Liu, P. -H.; Thebault, P.; Guenoun, P.; Daillant, J. Easy orientation of diblock copolymers on self-assembled monolayers using UV irradiation Macromolecules 2009, 42, 9609-9612
20. Han, E.; Stuen, K. O.; La, Y.-H.; Nealey, P. F.; Gopalan, P. Effect of composition of substrate-modifying random copolymers on the orientation of symmetric and asymmetric diblock copolymer domains Macromolecules 2008, 41, 9090-9097
21. Ham, S.; Shin, C.; Kim, E.; Ryu, D. Y.; Jeong, U.; Russell, T. P.; Hawker, C. J. Microdomain orientation of PS- b -PMMA by controlled interfacial interactions Macromolecules 2008, 41, 6431-6437
22. Ryu, D. Y.; Wang, J.-Y.; Lavery, K. A.; Drockenmuller, E.; Satija, S. K.; Hawker, C. J.; Russell, T. P. Surface modification with cross-linked random copolymers: minimum effective thickness Macromolecules 2007, 40, 4296-4300
23. Park, D.-H. The fabrication of thin films with nanopores and nanogrooves from block copolymer thin films on the neutral surface of self-assembled monolayers Nanotechnology 2007, 18, 355304
24. Niemz, A.; Bandyopadhyay, K.; Tan, E.; Cha, K.; Baker, S. M. Fabrication of nanoporous templates from diblock copolymer thin films on alkylchlorosilane-neutralized surfaces Langmuir 2006, 22, 11092-11096
25. Ryu, D. Y.; Shin, K.; Drockenmuller, E.; Hawker, C. J.; Russell, T. P. A generalized approach to the modification of solid surfaces Science 2005, 308, 236-239
26. Huang, E.; Russell, T. P.; Harrison, C.; Chaikin, P. M.; Register, R. A.; Hawker, C. J.; Mays, J. Using surface active random copolymers to control the domain orientation in diblock copolymer thin films Macromolecules 1998, 31, 7641-7650
27. Mansky, P.; Liu, Y.; Huang, E.; Russell, T. P.; Hawker, C. Controlling polymer-surface interactions with random copolymer brushes Science 1997, 275, 1458-1460
28. Mansky, P.; Russell, T. P.; Hawker, C. J.; Mays, J.; Cook, D. C.; Satija, S. K. Interfacial segregation in disordered block copolymers: effect of tunable surface potentials Phys. Rev. Lett. 1997, 79, 237-240
29. Farrell, R. A.; Fitzgerald, T. G.; Borah, D.; Holmes, J. D.; Morris, M. A. Chemical interactions and their role in the microphase separation of block copolymer thin films Int. J. Mol. Sci. 2009, 10, 3671-3712
30. Rasappa, S.; Borah, D.; Senthamaraikannan, R.; Faulkner, C. C.; Shaw, M. T.; Gleeson, P.; Holmes, J. D.; Morris, M. A. Block copolymer lithography: Feature size control and extension by an over-etch technique Thin Solid Films 2012, 522, 318-323
31. Farrell, R. A.; Kinahan, N. T.; Hansel, S.; Stuen, K. O.; Petkov, N.; Shaw, M. T.; West, L. E.; Djara, V.; Dunne, R. J.; Varona, O. G.; Gleeson, P. G.; Jung, S. -J.; Kim, H. -Y.; Kolesnik, M. M.; Lutz, T.; Murray, C. P.; Holmes, J. D.; Nealey, P. F.; Duesberg, G. S.; Krstić, V. K.; Morris, M. A. Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly Nanoscale 2012, 4, 3228-3236
32. Borah, D.; Shaw, M. T.; Rasappa, S.; Farrell, R. A.; O'Mahony, C.; Faulkner, C. M.; Bosea, M.; Gleeson, P.; Holmes, J. D.; Morris, M. A. Plasma etch technologies for the development of ultra-small feature size transistor devices J. Phys. D: Appl. Phys. 2011, 44, 174012-174023
33. Jung, Y. S.; Lee, J. H.; Lee, J. Y.; Ross, C. A. Fabrication of diverse metallic nanowire arrays based on block copolymer self-assembly Nano Lett. 2010, 10, 3722-3726
34. Bita, I.; Wang, J. K. W.; Jung, Y. S.; Ross, C. A.; Thomas, E. L.; Berggren, K. K. Graphoepitaxy of self-assembled block copolymers on two-dimensional periodic patterned templates Science 2008, 321, 939-943
35. Jung, Y. S.; Jung, W.; Ross, C. A. Nanofabricated concentric ring structures by templated self-assembly of a diblock copolymer Nano Lett. 2008, 8, 2975-2981
36. Ross, C. A.; Jung, Y. S.; Chuang, V. P.; Llievski, F.; Yang, J. K. W.; Bita, I.; Thomas, E. L.; Smith, H. I.; Berggren, K. K.; Vancso, G. J.; Cheng, J. Y. Si-containing block copolymers for self-assembled nanolithography J. Vac. Sci. Technol. B 2008, 26, 2489-2494
37. 2 thin films by UV-assisted ozonolysis of a polymer precursor Chem. Mater. 2001, 13, 967-972
38. Nose, T. Coexistence curves of polystyrene/poly(dimethylsiloxane) blends Polymer 1995, 36, 2243-2248
39. Smith, A. P.; Sehgal, A.; Douglas, J. F.; Karim, A.; Amis, E. J. Combinatorial mapping of surface energy effects on diblock copolymer thin film ordering Macromol. Rapid Commun. 2003, 24, 131-135
40. Peters, R. D.; Yang, X. M.; Kim, T. K.; Nealey, P. F. Wetting behavior of block copolymers on self-assembled films of alkylchlorosiloxanes: effect of grafting density Langmuir 2000, 16, 9620-9626
41. Peters, R. D.; Yang, X. M.; Nealey, P. F. Morphology of thin films of diblock copolymers on surfaces micropatterned with regions of different interfacial energy Macromolecules 2002, 35, 1822-1834
42. Ostaci, R. -V.; Damiron, D.; Akhrass, S. A.; Grohens, Y.; Drockenmuller, E. Poly(ethylene glycol) brushes grafted to silicon substrates by click chemistry: influence of PEG chain length, concentration in the grafting solution and reaction time Polym. Chem. 2011, 2, 348-354
43. Sakellariou, G.; Park, M.; Advincula, R.; Mays, J. W.; Hadjichristidis, N. Homopolymer and block copolymer brushes on gold by living anionic surface-initiated polymerization in a polar solvent J. Polym. Sci., Part A: Polym. Chem. 2006, 44, 769-782
44. Sanderson, L. A. W.; Emoto, K.; Van Alstine, J. M.; Weimer, J. J. Characterization of grafted poly(ethylene glycol) on Si wafers using scanning probe microscopy J. Colloid Interface Sci. 1998, 207, 180-183
45. Schachtschneider, J. H.; Snyder, R. G. Vibrational analysis of the n-paraffins-II: normal co-ordinate calculations Spectrochim. Acta 1963, 19, 117-168
46. Lee, A. F.; Gawthrope, D. E.; Hart, N. J.; Wilson, K. A fast XPS study of the surface chemistry of ethanol over Pt{1 1 1} Surf. Sci. 2004, 548, 200-208
47. Bermudez, V. M.; Berry, A. D.; Kim, H.; Pique, A. Functionalization of indium tin oxide Langmuir 2006, 22, 11113-11125
48. Andreozzi, A.; Poliani, E.; Sequini, G.; Perego, M. The effect of random copolymer on the characteristic dimensions of cylinder-forming PS- b -PMMA thin films Nanotechnology 2011, 22, 185304-185312
49. Kirk, C. T. Quantitative analysis of the effect of disorder-induced mode coupling on infrared absorption in silica Phys. Rev. B 1998, 38, 1255-1273
50. Moon, H. -S.; Shin, D. O.; Kim, B. H.; Jin, H. M.; Lee, S.; Lee, M. G.; Kim, S. O. Large-area, highly oriented lamellar block copolymer nanopatterning directed by graphoepitaxially assembled cylinder nanopatterns J. Mater. Chem. 2012, 22, 6307-6310
51. Zhang, X.; Douglas, J. F.; Jones, R. L. Influence of film casting method on block copolymer ordering in thin films Soft Matter 2012, 8, 4980-4987
52. Jeong, U.; Ryu, D. Y.; Kim, K. J.; Kim, D. H.; Russell, T. P.; Hawker, C. J. Volume contractions induced by crosslinking: a novel route to nanoporous polymer films Adv. Mater. 2003, 15, 1247-1250