Block copolymer lithography: Feature size control and extension by an over-etch technique

Thin Solid Films

Volumn 522, Issue , 2012, Pages 318-323

  Rasappa, Sozaraj ^a,b,c   Borah, Dipu ^a,b,c   Senthamaraikannan, Ramsankar ^a,b   Faulkner, Colm C ^b   Shaw, Matthew T ^a,b,c,d   Gleeson, Peter ^b,d   Holmes, Justin D ^a,b,c   Morris, Michael A ^a,b,c  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b TRINITY COLLEGE DUBLIN   (Ireland)

^c UNIVERSITY COLLEGE CORK   (Ireland)

^d Intel Ireland Ltd   (Ireland)

Author keywords

Block copolymer; Lithography; Over etching; Plasma etching; Polystyrene b polymethylmethacrylate; Self assembly; Silicon nanowires

Indexed keywords

BLOCK COPOLYMER LITHOGRAPHY; FEATURE SIZES; NANO SCALE; NANOSCALE FEATURES; OVER-ETCH; OVER-ETCHING; PATTERN TRANSFERS; POLYSTYRENE-B-POLYMETHYLMETHACRYLATE; SILICON NANOWIRES;

LITHOGRAPHY; NANOTECHNOLOGY; NANOWIRES; PLASMA ETCHING; POLYESTERS; POLYSTYRENES; SELF ASSEMBLY; SILICON;

BLOCK COPOLYMERS;

EID: 84868593394     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.09.017     Document Type: Conference Paper

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