Evaluation of EUV resist performance below 20nm CD using helium ion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 9048, Issue , 2014, Pages

  Maas, Diederik ^a   Van Veldhoven, Emile ^a   Van Langen Suurling, Anja ^b   Alkemade, Paul F A ^b   Wuister, Sander ^c   Hoefnagels, Rik ^c   Verspaget, Coen ^c   Meessen, Jeroen ^c   Fliervoet, Timon ^c  

^a TNO   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c ASML   (Netherlands)

Author keywords

Energy transfer; EUV lithography; EUV resist characterization; Helium Ion Microscope; Lithography; Proximity effect; Scanning Helium Ion Beam Lithography

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ENERGY TRANSFER; EXTREME ULTRAVIOLET LITHOGRAPHY; ION BEAM LITHOGRAPHY; ION BEAMS; LITHOGRAPHY;

CHEMICALLY AMPLIFIED; ENERGY DISTRIBUTIONS; EUV RESISTS; HELIUM ION BEAMS; HELIUM ION MICROSCOPES; PROXIMITY CORRECTION; PROXIMITY EFFECTS; SECONDARY ELECTRONS;

IONS;

EID: 84902150141     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2046917     Document Type: Conference Paper

References (18)

1. Gallatin, G.M., "Resist blur and line edge roughness," Proc. SPIE 5754, 38-52 (2005).
2. Ayothi, R., Singh, L., Hishiro, Y., Pitera, J.W., Sundberg, L.K., Sanchez, M.I., Bozano, L., Virwani, K., Truong, H.D., Arellano, N., Petrillo, K., Wallraff, G.M., Hinsberg, W.D. and Hua, Y., "Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling," J. Vac. Sci. Technol. B 30 06F506 (2012).
3. Thackeray, J., Cameron, J., Jain, V., LaBeaume, P., Coley, S., Ongayi, O., Wagner, M., Rachford A. and Biafore, J., "Pursuit of lower Critical Dimensional Uniformity in EUV resists," J. Photopolym. Sci. Technol. 26, 605-610 (2013).
4. Sidorkin, V., van Veldhoven, E. van der Drift, E., Alkemade, P., Salemink, H. and Maas, D., "Sub-10-nm nanolithography with a scanning helium beam," J. Vac. Sci. Technol. B 27, L18 (2009).
5. Maas, D.J., van der Drift, E.W., van Veldhoven, E., Meessen, J., Rudneva, M. and Alkemade, P.F.A., "Nanoengineering with a focused helium ion beam," Mater. Res. Soc. Symp. Proc. 1354, 33-46 (2011).
6. van der Drift, E.W.J.M. and Maas, D.J. "Helium ion lithography," in M. Stepanova & S Dew (Eds.), [Nanofabrication, techniques and principles], Springer, 93-116 (2010).
7. Bozano, L.D., Brock, P.J., Truong, H.D., Sanchez, M.I., Wallraff, G.M., Hinsberg, W.D., Allen, R.D., Fujiwara, M. and Maeda, K. "Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers," Proc. SPIE 7972, 797218 (2011).
8. Ekinci, Y., Vockenhuber, M., Terhalle, B., Hojeij, M., Wang, L. and Younkin, T.R. "Evaluation of resist performance with EUV interference lithography for sub-22 nm patterning," Proc. SPIE 8322, 83220W (2012)
9. Li, W.-D., Wu, W. and Williams, R.S. "Combined helium ion beam and nanoimprint lithography attains 4nm halfpitch dense patterns," J. Vac. Sci. Technol. B 30 06F304 (2012).
10. Hill, R. and Rahman, F.H.M. "Advances in helium ion microscopy," Nucl. Instrum. Methods A 645, 96-101 (2011)
11. Kozawa T. and Tagawa, S. "Radiation Chemistry in Chemically Amplified Resists," Japanese Journal of Applied Physics 49, 030001 (2010).
12. Torok, J., del Re, R., Herbol, H., Das, S., Bocharova, I., Paolucci, A., Ocola, L., Ventrice Jr., C., Lifshin, E., Denbeaux, G. and Brainard, R. "Secondary electrons in EUV lithography," J. Photopolym. Sci. Technol. 26, 625-634 (2013).
13. Petrov, Y. and Vyvenko, O. "Secondary electron emission spectra and energy selective imaging in helium ion microscope," Proc. SPIE 8036, 80360O (2011).
14. Henke, B.L., Gullikson, E.M. and Davis, J.C. "X-ray interactions: photoabsorption, scattering, transmission, and reflection at E=50-30000 eV, Z=1-92," [Atomic Data and Nuclear Data Tables] Vol. 54 (no.2), 181-342 (July 1993). (http://henke.lbl.gov/optical-constants/).
15. Fedynyshyn, T.H., Goodman, R.B., Cabral, A., Tarrio, C. and, Lucatorto, T.B. "Polymer photochemistry at the EUV wavelength, Proc. SPIE, 7639, 76390A (2010).
16. Ziegler, J.F., Ziegler, M.D. and Biersack, J.P. "SRIM - The stopping and range of ions in matter," Nucl. Instr. Methods B, 268, 1818-1823 (2010).
17. Winston, D., Ferrera, J., Battistella, L., Vladár, A.E. and Berggren, K.K., "Modeling the point-spread function in helium-ion lithography," Scanning, 34 121-128 (2012).
18. Brodie, A., Kojima, S., McCord, M., Grella, L., Gubiotti, T., and Bevis, C. "Preliminary investigation of shot noise, dose, and focus latitude for E-Beam Direct Write," Proc. SPIE 8680, 868029 (2013).