Epitaxial strontium titanate films grown by atomic layer deposition on SrTiO3-buffered Si(001) substrates

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 1, 2013, Pages

  McDaniel, Martin D ^a   Posadas, Agham ^b   Ngo, Thong Q ^a   Dhamdhere, Ajit ^c   Smith, David J ^c   Demkov, Alexander A ^b   Ekerdt, John G ^a  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^c ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALD GROWTH; ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; CARBON INCORPORATION; CARBON SPECIES; CONFORMAL GROWTH; COREACTANTS; CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; HIGH VACUUM; POST-DEPOSITION; ROCKING CURVES; SI (001) SUBSTRATE; SITU X-RAY PHOTOELECTRON SPECTROSCOPY; SMOOTH INTERFACE; SRTIO; STO FILMS; SUBSTRATE TEMPERATURE; SURFACE TEMPLATES; TITANIUM TETRAISOPROPOXIDE; UNIT CELLS; XPS ANALYSIS;

AMORPHOUS FILMS; AMORPHOUS SILICON; ATOMIC LAYER DEPOSITION; BUFFER LAYERS; CARBON; CARBON FILMS; CRYSTALLINE MATERIALS; DEPOSITS; EPITAXIAL FILMS; MOLECULAR BEAM EPITAXY; PHOTOELECTRONS; SILICON; STRONTIUM; STRONTIUM TITANATES; SUBSTRATES; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACES (MATERIALS);

EID: 84871916064     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4770291     Document Type: Article

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