Real-time spectroscopic ellipsometric investigation of adsorption and desorption in atomic layer deposition: A case study for the strontium bis(tri-isopropylcyclopentadienyl)/water process

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

  Wang, Han ^a   Jiang, Xiaoqiang ^a   Willis, Brian G ^a  

^a UNIVERSITY OF CONNECTICUT   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TEMPERATURES; ELLIPSOMETRIC PARAMETERS; GROWTH PER CYCLE; HALF CYCLE; OPERATION REGIME; REACTION MECHANISM; REAL TIME SPECTROSCOPIC ELLIPSOMETRY; SUBMONOLAYER; THEORETICAL MODELS; UPPER LIMITS;

ADSORPTION; ATOMIC LAYER DEPOSITION; ATOMIC SPECTROSCOPY; C (PROGRAMMING LANGUAGE); DESORPTION; SPECTROSCOPIC ELLIPSOMETRY; STRONTIUM;

DEPOSITION;

EID: 84862915152     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3664757     Document Type: Article

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