Epitaxial BiFeO 3 thin films on Si

Applied Physics Letters

Volumn 85, Issue 13, 2004, Pages 2574-2576

  Wang, J ^a   Zheng, H ^a   Ma, Z ^a   Prasertchoung, S ^a   Wuttig, M ^a   Droopad, R ^b   Yu, J ^b   Eisenbeiser, K ^b   Ramesh, R ^c  

^a UNIVERSITY OF MARYLAND   (United States)

^b MOTOROLA INC   (United States)

^c Lawrence Berkeley National Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HETEROEPITAXIAL GROWTH; HYSTERESIS LOOPS; PIEZOELECTRIC COEFFICIENTS; PULSED REMNANT POLARIZATION;

ACTUATORS; BISMUTH COMPOUNDS; COMPRESSIVE STRESS; ELECTROMAGNETIC WAVE POLARIZATION; ELECTRON DIFFRACTION; FERROELECTRIC MATERIALS; FILM GROWTH; MICROELECTROMECHANICAL DEVICES; MOLECULAR BEAM EPITAXY; PERMITTIVITY; PIEZOELECTRIC MATERIALS; PIEZOELECTRICITY; PULSED LASER DEPOSITION; THERMAL STRESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 7544221269     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1799234     Document Type: Article

References (11)

1. C. Michel, J.-M. Moreau, G. D. Achenbach, R. Gerson, and W. J. James, Solid State Commun. 7, 701 (1369).
2. J. J. Jacobson and B. F. F. Fender, J. Phys. C 8, 844 (1975).
3. J. R. Teague, R. Gerson, and W. J. James, Solid State Common. 8, 1073 (1970).
4. J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, Science 299, 1719 (2003).
5. K. Y. Kun, M. Noda, and M. Okuyama, Appl. Phys. Lett. 83, 3981 (2003).
6. K. Eisenbeiser, J. M. Finder, Z. Yu, I. Ramdani, J. A. Curless, J. A. Hallmark, R. Droopad, W. J. Ooms, L. Salem, S. Bradshaw, and C. D. Overgaard, Appl. Phys. Lett. 76, 1324 (2000).
7. R. A. McKee, F. J. Walker, and M. F. Chisholm, Phys. Rev. Lett. 81, 3014 (1998).
8. Y. Wang, C. Ganpule, B. T. Lin, H. Li, K. Mori, B. Hill, M. Wuttig, R. Ramesha, J. Finder, Z. Yu, R. Droopad, and K. Eisenbeiser, Appl. Phys. Lett. 80, 97 (2002).
9. B. T. Liu, K. Maki, Y. So, V. Nagarajan, R. Ramesha, J. Lettieri, J. H. Haeni, D. G. Schlom, W. Tian, X. Q. Pan, F. J. Walker, and R. A. McKee, Appl. Phys. Lett. 80, 4801 (2002).
10. J. D. Bucci, B. K. Robertson, and W. J. James, J. Appl. Crystallogr. 5, 187 (1972).
11. J. F. Li, J. Wang, M. Wuttig, R. Ramesh, N. Wang, B. Ruette, A. P. Pyatakov, A. K. Zvezdin, and D. Viehland, Appl. Phys. Lett 84, 5261 (2004).