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Applied Surface Science

Volumn 181, Issue 3-4, 2001, Pages 339-348

Influence of structure development on atomic layer deposition of TiO 2 thin films

(5) Aarik, J a Karlis, J a Mandar H a Uustare, T a Sammelselg, V a

a UNIVERSITY OF TARTU (Estonia)

Author keywords

Adsorption; Atomic layer deposition; Crystallization; Surface morphology; Titanium dioxide

Indexed keywords

ADSORPTION; CRYSTALLIZATION; DEPOSITION; FILM GROWTH; MICROSTRUCTURE; MORPHOLOGY; SURFACE ROUGHNESS; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION;

THIN FILMS;

EID: 0035928970 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(01)00430-5 Document Type: Article

Times cited : (98)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.