The potential of ion-driven etching with simultaneous deposition of impurities for inducing periodic dots on surfaces

Journal of Physics D: Applied Physics

Volumn 45, Issue 16, 2012, Pages

  Kokkoris, George ^a   Gogolides, Evangelos ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHING; ETCH STOP; ETCHING SELECTIVITY; GENERIC MECHANISM; ION-BEAM SPUTTERING; MONTE CARLO MODELLING; MORPHOLOGY EVOLUTION; PHYSICAL SPUTTERING; PLASMA BULK; REACTOR WALLS; SHADOWING GROWTH; SIMULTANEOUS DEPOSITION; STICKING PROBABILITY;

IONS;

PLASMA DEPOSITION;

EID: 84859343969     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/16/165204     Document Type: Article

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