Silicon columnar microstructures induced by an SF6/O2 plasma

Journal of Physics D: Applied Physics

Volumn 38, Issue 18, 2005, Pages 3395-3402

  Dussart, R ^a   Mellhaoui, X ^a   Tillocher, T ^a   Lefaucheux, P ^a   Volatier, M ^a   Socquet Clerc, C ^a   Brault, P ^a   Ranson, P ^a  

^a UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COOLING; CRYSTALLOGRAPHY; ELECTRIC POTENTIAL; IMAGE PROCESSING; LOW TEMPERATURE EFFECTS; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SILICON;

BIAS VOLTAGE; COLUMNAR MICROSTRUCTURE (CMS); GAS PRESSURE; MICROGRAPHS;

INDUCTIVELY COUPLED PLASMA;

EID: 24644434887     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/18/012     Document Type: Article

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