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Volumn 21, Issue 22, 2009, Pages

Highly ordered nanopatterns on Ge and Si surfaces by ion beam sputtering

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PARAMETER; BROAD BEAMS; DEGREE OF FREEDOM; DIFFERENT PROCESS; DOT PATTERNS; GE SURFACES; ION-BEAM SPUTTERING; LONG RANGE; LOW ENERGY ION BEAM; LOW-ENERGY ION BEAM EROSION; MATERIAL EROSION; NANO PATTERN; PATTERN FORMATION; ROOM TEMPERATURE; SAMPLE ROTATION; SI SURFACES; SURFACE EROSION;

EID: 66249133976     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/21/22/224003     Document Type: Article
Times cited : (126)

References (63)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.