Is keV ion-induced pattern formation on Si(001) caused by metal impurities?

Nanotechnology

Volumn 21, Issue 8, 2010, Pages

  MacKo, Sven ^a   Frost, Frank ^b   Ziberi, Bashkim ^b   Förster, Daniel F ^a   Michely, Thomas ^a  

^a UNIVERSITY OF COLOGNE   (Germany)

^b LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANGULAR DEPENDENCE; ANGULAR RANGE; CONTINUUM THEORY; DEPENDENT STABILITY; FLUENCES; GRAZING INCIDENCE; ION BEAM EROSION; METAL IMPURITIES; PATTERN FORMATION; SI(0 0 1); SPUTTERING YIELDS; SURFACE NORMALS; SURFACE PROFILES;

BEAM PLASMA INTERACTIONS; CONTINUUM MECHANICS; DIRECTIONAL PATTERNS (ANTENNA); ION BEAMS; ION BOMBARDMENT; ION SOURCES; KRYPTON; SILICON; SPUTTERING; STAINLESS STEEL; VACUUM;

IONS;

EID: 76249131122     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/8/085301     Document Type: Article

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