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Applied Physics A: Materials Science and Processing

Volumn 92, Issue 3, 2008, Pages 517-524

Surfactant sputtering

(2) Hofsäss, Hans a Zhang, Kun a

a UNIVERSITY OF GÖTTINGEN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ION BOMBARDMENT; MACHINING; SPUTTERING; SURFACE ACTIVE AGENTS; SURFACES; THICK FILMS;

ATOMIC SCALES; MICRO-MACHINING; NANO-STRUCTURING; REACTIVE ION; RIPPLE PATTERNS; SPUTTER EROSION; STEADY STATES; SUBSTRATE SURFACES; SURFACE POLISHING; THIN FILM COATINGS;

REACTIVE ION ETCHING;

EID: 48349134876 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-008-4678-9 Document Type: Conference Paper

Times cited : (70)

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