Ion beam sputtering: A route for fabrication of highly ordered nanopatterns

Advanced Structured Materials

Volumn 10, Issue , 2011, Pages 69-94

  Cornejo, Marina ^a   Völlner, Jens ^a   Ziberi, Bashkim ^a   Frost, Frank ^a   Rauschenbach, Bernd ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 80054996448     PISSN: 18698433     EISSN: 18698441     Source Type: Book Series    
DOI: 10.1007/978-3-642-17782-8_4     Document Type: Article

References (79)

1. Navez, M., Sella, C., Chaperot, D.: Microscopie electronique-étude de lattaque du verrepar bombardement ionique. CR Acad. Sci. 254, 240 (1962)
2. Bradley, R.M., Harper, J.M.E.: Theory of ripple topography induced by ion bombardment. J. Vac. Sci. Technol. A 6(4), 2390-2395 (1988)
3. Castro, M., Cuerno, R., Vázquez, L., Gago, R.: Self-organized ordering of nanostructures produced by ion-beam sputtering. Phys. Rev. Lett. 94, 016102 (2005)
4. Cuerno, R., Makse, H.A., Tomassone, S., Harrington, S.T., Stanley, H.E.: Stochastic model for surface erosion via ion sputtering: dynamical evolution from ripple morphology to rough morphology. Phys. Rev. Lett. 75, 4464 (1995)
5. Facsko, S., Bobek, T., Stahl, A., Kurz, H., Dekorsy, T.: Dissipative continuum model for self-organized pattern formation during ion-beam erosion. Phys. Rev. B 69, 153412 (2004)
6. Makeev, M.A., Cuerno, R., Barabási, A.-L.: Morphology of ion-sputtered surfaces. Nucl. Instrum. Methods Phys. Res. B 197, 185-227 (2002)
7. Park, S., Kahng, B., Jeong, H., Barabási, A.-L.: Dynamics of ripple formation in sputter erosion: nonlinear phenomena. Phys. Rev. Lett. 83, 4 (1999)
8. Rost, M., Krug, J.: Anisotropic Kuramoto-Sivashinsky equation for surface growth and erosion. Phys. Rev. Lett. 75, 3894-3899 (1995)
9. Vogel, S., Linz, S.: Continuum modeling of sputter erosion under normal incidence: Interplay between nonlocality and nonlinearity. Phys. Rev. B 72, 035416 (2005)
10. Sigmund, P.: A mechanism of surface micro-roughening by ion bombardment. J. Mater. Sci. 8, 1545-1553 (1973)
11. Ziberi, B.: Ion beam induced pattern formation on Si and Ge surfaces. PhD Thesis, Leipzig (2006)
12. Kaufman, H.R., Cuomo, J.J., Harper, J.M.E.: Technology and applications of broad-beam ion sources used in sputtering. Part I. Ion source technology. J. Vac. Sci. Technol. 21, 725-736 (1982)
13. Cuomo, J.J., Rossnagel, S.M., Kaufman, H.R.: Handbook of Ion Beam Processing Technology. Noyes Publications, USA (1989)
14. + ions. Appl. Phys. Lett. 81, 2770-2772 (2002)
15. Gago, R., Cuerno, R., Varela, M., Ballesteros, C., Albella, J.M.: Production of ordered silicon nanocrystals by low-energy ion sputtering. Appl. Phys. Lett. 78, 3316-3318 (2001)
16. Gago, R., Vázquez, L., Cuerno, R., Varela, M., Ballesteros, C., Albella, J.M.: Nanopatterning of silicon surfaces by low-energy ion-beam sputtering: dependence on the angle of ion incidence. Nanotechnology 13, 304-308 (2002)
17. Erlebacher, J., Aziz, M.J., Chason, E., Sinclair, M.B., Floro, J.A.: Spontaneous pattern formation on ion bombarded Si(001). Phys. Rev. Lett. 82(11), 2330-2333 (1999)
18. Carbone, D., Alija, A., Plantevin, O., Gago, R., Facsko, S., Metzger, T.H.: Early stage of ripple formation on Ge(001) surfaces under near-normal ion beam sputtering. Nanotechnology 19, 035304 (2008)
19. Toma, A., Buatier de Mongeot, F., Buzio, R., Firpo, G., Bhattacharyya, S.R., Boragno, C., Valbusa, U.: Ion beam erosion of amorphous materials: evolution of surface morphology. Nucl. Instrum. Methods Phys. Res. B 230, 551-554 (2005)
20. Ziberi, B., Frost, F., Höche, T., Rauschenbach, B.: Ripple pattern formation on silicon surfaces by low-energy ion beam erosion: Experiment and theory. Phys. Rev. B 72, 235310 (2005)
21. Ziberi, B., Frost, F., Neumann, H., Rauschenbach, B.: Ripple rotation, pattern transitions, and long range ordered dots on silicon by ion beam erosion. Appl. Phys. Lett. 92, 063102 (2008)
22. Ziberi, B., Frost, F., Tartz, M., Neumann, H., Rauschenbach, B.: Importance of ion beam parameters on self-organized pattern formation on semiconductor surfaces by ion beam erosion. Thin Solid Films 459, 106-110 (2004)
23. Frost, F., Rauschenbach, B.: Nanostructuring of solid surfaces by ion-beam erosion. Appl. Phys. A 77, 1-9 (2003)
24. Brown, A.D., Erlebacher, J.: Temperature and fluence effects on the evolution of regular surface morphologies on ion-sputtered Si(111). Phys. Rev. B 72, 075350 (2005)
25. Chini, T.K., Sanyal, M.K., Bhattacharyya, S.R.: Energy-dependent wavelength of the ion-induced nanoscale ripple. Phys. Rev. B 66, 153404 (2002)
26. Carter, G., Nobes, M.J., Paton, F., Williams, J.S., Whitton, J.L.: Ion bombardment induced ripple topography on amorphous solids. Radiat. Eff. Defects Solids 33, 65-73 (1977)
27. Zhang, K., Rotter, F., Uhrmacher, M., Ronning, C., Hofsäss, H., Krauser, J.: Pattern formation of Si surfaces by low-energy sputter erosion. Surf. Coat Technol. 201, 8299-8302 (2007)
28. Chason, E., Mayer, T.M., Kellermann, B.K., McIlroy DN J.H.A.: Roughening instability and evolution of the Ge(001) surface during ion sputtering. Phys. Rev. Lett. 72(19), 3040-3043 (1994)
29. Facsko, S., Kurz, H., Dekorsy, T.: Energy dependence of quantum dot formation by ion sputtering. Phys. Rev. B 63, 165329 (2001)
30. Frost, F., Schindler, A., Bigl, F.: Roughness evolution of ion sputtered rotating InP surfaces: pattern formation and scaling laws. Phys. Rev. Lett. 85(19), 4116-4119 (2000)
31. Boragno, C., Buatier de Mongeot, F., Constantini, G., Molle, A., de Sanctis, D., Valbusa, U.: Time evolution of the local slope during Cu(110) ion sputtering. Phys. Rev. B 68, 094102 (2003)
32. Valbusa, U., Boragno, C., Buatier de Mongeot, F.: Nanostructuring by ion beam. Mater. Sci. Eng. C 23, 201-209 (2003)
33. Rusponi, S., Constantini, G., Boragno, C., Valbusa, U.: Ripple wave vector rotation in anisotropic crystal sputtering. Phys. Rev. Lett. 81, 2735-2738 (1998)
34. van Dijken, S., De Bruin, D., Poelsema, B.: Kinetic physical etching for versatile novel design of well ordered self-affine nanogrooves. Phys. Rev. Lett. 86, 4608-4611 (2001)
35. Toma, A., Šetina Batič, B., Chiappe, D., Boragno, C., Valbusa, U., Godec, M., Jenko, M., Buatier de Mongeot, F.: Patterning polycrystalline thin films by defocused ion beam: the influence of initial morphology on the evolution of self-organized nanostructures. J. Appl. Phys. 104, 104313 (2008)
36. Ghose, D.: Ion beam sputtering induced nanostructuring of polycrystalline metal films. J. Phys: Condens. Matter 21, 224001 (2009)
37. Karmakar, P., Ghose, D.: Ion beam sputtering induced ripple formation in thin metal films. Surf. Sci. 554, L101-L106 (2004)
38. Flamm, D., Frost, F., Hirsch, D.: Evolution of surface topography of fused silica by ion beam sputtering. Appl. Surf. Sci. 179, 96-102 (2001)
39. Umbach, C.C., Headrick, R.L., Chang, K.-C.: Spontaneous nanoscale corrugation of ion-eroded SiO2: the role of ion-irradiation-enhanced viscous flow. Phys. Rev. Lett. 87, 246104 (2001)
40. Mayer, T.M., Chason, E., Howard, A.J.: Roughening instability and ion-induced viscous relaxation of SiO2 surfaces. J. Appl. Phys. 76, 1633-1643 (1994)
41. Frost, F., Ziberi, B., Schindler, A., Rauschenbach, B.: Surface engineering with ion beams: from self-organized nanostructures to ultra-smooth surfaces. Appl. Phys. A 91, 9 (2008)
42. Frost, F., Fechner, R., Flamm, D., Ziberi, B., Frank, W., Schindler, A.: Ion beam assisted smoothing of optical surfaces. Appl. Phys. A 78, 651-654 (2004)
43. Frost, F., Fechner, R., Ziberi, B., Völlner, J., Flamm, D., Schindler, A.: Large area smoothing of surfaces by ion bombardment: fundamentals and applications. J. Phys.: Condens. Matter 21, 224026 (2009)
44. Keller, A., Roßbach, S., Facsko, S., Möller, W.: Simultaneous formation of two ripple modes on ion sputtered silicon. Nanotechnology 19, 135303 (2008)
45. Chini, T.K., Datta, D.P., Bhattacharyya, S.R.: Ripple formation on silicon by medium energy ion bombardment. J. Phys.: Condens. Matter 21, 224004 (2009)
46. Ozaydin-Ince, G., Ludwig, K.F.J.: In situ X-ray studies of native and Mo-seeded surface nanostructuring during ion bombardment of Si(100). J. Phys.: Condens. Matter 21, 224008 (2009)
47. Madi, C.S., Bola George, H., Aziz, M.J.: Linear stability and instability pattern in ion-sputtered silicon. J. Phys.: Condens. Matter 21, 224010 (2009)
48. Ziberi, B., Frost, F., Höche, T., Rauschenbach, B.: Ion-induced self-organized dot and ripple patterns on Si surfaces. Vacuum 81, 155-159 (2006)
49. Madi, C.S., Davidovitch, B., Bola George, H., Norris, S.A., Brenner, M.P., Aziz, M.J.: Multiple bifurcation types and the linear dynamics of ion sputtered surfaces. Phys. Rev. Lett. 101, 246102 (2008)
50. + ion bombardment. J. Appl. Phys. 103, 033512 (2008)
51. Gago, R., Vázquez, L., Plantevin, O., Sánchez-García, J.A., Varela, M., Ballesteros, C., Albella, J.M., Metzger, T.H.: Temperature influence on the production of nanodot patterns by ion beam sputtering of Si(001). Phys. Rev. B 73, 145414 (2006)
52. Habenicht, S., Lieb, K.P., Koch, J., Wieck, A.D.: Ripple propagation and velocity dispersion on ion-beam eroded silicon surfaces. Phys. Rev. B 65, 115327 (2002)
53. Ziberi, B., Frost, F., Rauschenbach, B.: Pattern transition on Ge surfaces during low-energy ion beam erosion. Appl. Phys. Lett. 88, 173115 (2006)
54. Erlebacher, J., Aziz, M.J., Chason, E., Sinclair, M.B., Floro, J.A.: Nonlinear amplitude evolution during spontaneous patterning of ion-bombarded Si(001). J. Vac. Sci. Technol. A 18, 115-120 (2000)
55. Pelliccione, M., Lu, T.-M.: Evolution of thin-film morphology: modeling and simulations. Springer, Berlin-Heidelberg (2008)
56. Hazra, S., Chini, T.K., Sanyal, M.K., Grenzer, J., Pietsch, U.: Ripple structure of crystalline layers in ion-beam-induced Si wafers. Phys. Rev. B 70, 121307 (2004)
57. Güntherschulze, A., Tollmien, W.: Neue Untersuchungen über die Kathodenzerstäubung der Glimmentladung. Z Phys. 119, 685-695 (1942)
58. +-sputtering Si/Mo targets. J. Cryst. Growth 234, 654-659 (2002)
59. Wehner, G.K.: Cone formation as a result of whisker growth on ion bombardment metal surfaces. J. Vac. Sci. Technol. A 3, 1821-1835 (1985)
60. Wehner, G.K., Hajicek, D.J.: Cone formation on metal targets during sputtering. J. Appl. Phys. 42(3), 1145-1149 (1971)
61. Morishita, S., Fujimoto, Y., Okuyama, F.: Morphological and structural features of copper seed cones. J. Vac. Sci. Technol. A 6, 217-222 (1988)
62. Ozaydin, G., Özcan, A.S., Wang, Y., Ludwig, F.J., Zhou, H., Headrick, R.L.: Real-time X-ray of the growth of Mo-seeded Si nanodots by low-energy ion bombardment. Nucl. Instrum. Methods Phys. Res. B 264, 47-54 (2007)
63. Ozaydin, G., Özcan, A.S., Wang, Y., Ludwig, K.F.J., Zhou, H., Headrick, R.L., Siddons, D.P.: Real-time x-ray studies of Mo-seeded Si nanodot formation during ion bombardment. Appl. Phys. Lett. 87, 163104 (2005)
64. Sánchez-García, J.A., Gago, R., Caillard, R., Redondo-Cubero, A., Martin-Gago, J.A., Palomares, F.J., Fernández, M., Vázquez, L.: Production of nanohole/nanodot patterns on Si(001) by ion beam sputtering with simultaneous metal incorporation. J. Phys.: Condens. Matter 21, 224009 (2009)
65. Sánchez-García, J.A., Vázquez, L., Gago, R., Redondo-Cubero, A., Albella, J.M., Czigány, Z.: Tuning the surface morphology in self-organized ion beam nanopatterning of Si(001) via metal incorporation: from holes to dots. Nanotechnology 19, 355306 (2008)
66. Becker, R., Herrmannsfeldt, W.B.: IGUN: a program for the simulation of positive ion extraction including magnetic fields. Rev. Sci. Instrum. 63, 3 (1992)
67. Macko, S., Frost, F., Ziberi, B., Förster, D., Michely, T.: Is keV ion-induced pattern formation on Si(001) caused by metal impurities? Nanotechnology 21, 085301 (2010)
68. Eckstein, W.: Backscattering and sputtering with the Monte-Carlo program TRIM.SP. Radiat. Eff. Defects Solids 130, 239-250 (1994)
69. Hofsäss, H., Zhang, K.: Surfactant sputtering. Appl. Phys. A 92, 517-524 (2008)
70. Hofsäss, H., Zhang, K.: Fundamentals of surfactant sputtering. Nucl. Instrum. Methods Phys. Res. B 267, 2731-2734 (2009)
71. Ozaydin, G., Ludwig, F.J., Zhou, W., Headrick, R.L.: Effects of Mo seeding on the formation of Si nanodots during low-energy ion bombardment. J. Vac. Sci. Technol. B 26, 551 (2008)
72. Carbone, D., Biermanns, A., Ziberi, B., Frost, F., Plantevin, O., Pietsch, U., Metzger, T.H.: Ion-induced nanopatterns on semiconductor surfaces investigated by grazing incidence x-ray scattering techniques. J. Phys.: Condens. Matter 21, 224007 (2009)
73. Nozu, M., Tanemura, M., Okuyama, F.: Direct evidence for In-crystallite growth on sputter-induced InP cones. Surf. Sci. Lett. 304, L468-L474 (1994)
74. Tanemura, M., Aoyama, S., Fujimoto, Y., Okuyama, F.: Structural and compositional analyses of coned formed on ion-sputtered GaAs surfaces. Nucl. Instrum. Methods Phys. Res. B 61, 451-456 (1991)
75. Facsko, S., Dekorsy, T., Koerdt, C., Trappe, C., Kurz, H., Vogt, A., Hartnagel, H.L.: Formation of ordered nanoscale semiconductor dots by ion sputtering. Science 285, 1551-1553 (1999)
76. Buatier de Mongeot, F., Valbusa, U.: Applications of metal surfaces nanostructured by ion beam sputtering. J. Phys.: Condens. Matter 21, 224022 (2009)
77. Toma, A., Chiappe, D., Šetina Batič, B., Godec, M., Jenko, M., Buatier de Mongeot, F.: Erosive versus shadowing instabilities in the self-organized ion patterning of polycrystalline metal films. Phys. Rev. B 78, 4 (2008)
78. Stepanova, M., Dew, S.K.: Ion beam sputtering nanopatterning of thin metal films: the synergism of kinetic self-organization and coarsening. J. Phys.: Condens. Matter 21, 224014 (2009)
79. Zhang, K., Uhrmacher, M., Hofsäss, H., Krauser, J.: Magnetic texturing of ferromagnetic thin films by sputtering induced ripple formation. J. Appl. Phys. 103, 083507 (2008)