Production of nanohole/nanodot patterns on Si(001) by ion beam sputtering with simultaneous metal incorporation

Journal of Physics Condensed Matter

Volumn 21, Issue 22, 2009, Pages

  Snchez Garcia J A ^a   Gago, R ^a,b   Caillard, R ^a   Redondo Cubero, A ^b   Martin Gago, J A ^a,c   Palomares, F J ^a   Fernndez, M ^a   Vzquez, L ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b CENTRO DE MICROANÁLISIS DE MATERIALES   (Spain)

^c CENTRO DE ASTROBIOLOGÍA CSIC INTA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

COLD CATHODES; ION FLUENCES; ION FLUXES; ION-BEAM SPUTTERING; IRRADIATED SURFACE; METAL CONTENT; METAL INCORPORATION; METAL SILICIDE; NANODOT; NANODOT PATTERNS; NANODOTS; NANOHOLE; NORMAL INCIDENCE; PATTERN SELECTIVITY; RUTHERFORD BACKSCATTERING SPECTROMETRY; SAMPLE HOLDERS; SI(0 0 1); TARGET SURFACE;

ION BEAMS; ION SOURCES; IONS; METALS; MOLYBDENUM; MORPHOLOGY; NANOSTRUCTURED MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICIDES; SPUTTERING; WINDOWS;

SURFACE ANALYSIS;

EID: 66249125723     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/21/22/224009     Document Type: Article

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