Patterning polycrystalline thin films by defocused ion beam: The influence of initial morphology on the evolution of self-organized nanostructures

Journal of Applied Physics

Volumn 104, Issue 10, 2008, Pages

  Toma, A ^a,b   Batič, B Šetina ^c   Chiappe, D ^a,b   Boragno, C ^a,b   Valbusa, U ^a   Godec, M ^c   Jenko, M ^c   Buatier De Mongeot, F ^a,b  

^a UNIVERSITY OF GENOA   (Italy)

^b CNISM Unit di Genova   (Italy)

^c In titut Za Kovinske Materiale in Tehnologije   (Slovenia)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; CRYSTALLOGRAPHY; GRAIN BOUNDARIES; GRAIN GROWTH; ION BEAMS; NANOSTRUCTURES; PRECIOUS METALS; THICK FILMS;

AR+ IONS; CROSS OVERS; DIELECTRIC SUBSTRATES; EARLY STAGES; INITIAL MORPHOLOGIES; MOBILE DEFECTS; NANOSCALE; NOBLE METALS; POLYCRYSTAL LINES; POLYCRYSTALLINE GRAINS; POLYCRYSTALLINE THIN FILMS; SELF ORGANIZATIONS; SPUTTERING TIMES;

SINGLE CRYSTALS;

EID: 57049121694     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3021100     Document Type: Article

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