Nanopatterning of silicon surfaces by low-energy ion-beam sputtering: Dependence on the angle of ion incidence

Nanotechnology

Volumn 13, Issue 3, 2002, Pages 304-308

  Gago, R ^a,c   Vazquez L ^a   Cuerno, R ^b   Varela, M ^b   Ballesteros, C ^b   Albella, J M ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b UNIVERSIDAD CARLOS III DE MADRID   (Spain)

^c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFUSION; HIGH RESOLUTION ELECTRON MICROSCOPY; ION BEAMS; IRRADIATION; MORPHOLOGY; SILICON; SPUTTERING; SURFACE ROUGHNESS; SURFACE STRUCTURE;

LOW-ENERGY ION BEAM SPUTTERING;

NANOTECHNOLOGY;

EID: 0036609162     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/13/3/313     Document Type: Conference Paper

References (21)