Microstructural characterization of Si cones fabricated by Ar+-sputtering Si/Mo targets

Journal of Crystal Growth

Volumn 234, Issue 4, 2002, Pages 654-659

  Ma, X L ^a   Shang, N G ^a   Li, Q ^a   Lee, C S ^a   Bello, I ^a   Lee, S T ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

A1. Characterization; A1. Transmission electron microscopy; A2. Ion beam sputtering; B1. Silicon cones

Indexed keywords

ARGON; ION BEAM ASSISTED DEPOSITION; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

MICRODIFFRACTION;

SILICON WAFERS;

EID: 0036466652     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01769-9     Document Type: Article

References (12)