Pattern formation of Si surfaces by low-energy sputter erosion

Surface and Coatings Technology

Volumn 201, Issue 19-20 SPEC. ISS., 2007, Pages 8299-8302

  Zhang, K ^a   Rotter, F ^b   Uhrmacher, M ^a   Ronning, C ^a   Hofsass H ^a   Krauser, J ^b  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b HARZ UNIVERSITY OF APPLIED SCIENCES   (Germany)

Author keywords

Ion beam erosion; Silicon; Sputtering; Surface topography

Indexed keywords

LOW-ENERGY SPUTTER EROSION; RIPPLE FORMATION;

ATOMIC FORCE MICROSCOPY; ION BEAMS; ION BOMBARDMENT; SILICON; SURFACE TOPOGRAPHY;

SPUTTERING;

ATOMIC FORCE MICROSCOPY; ION BEAMS; ION BOMBARDMENT; SILICON; SPUTTERING; SURFACE TOPOGRAPHY;

EID: 34447503550     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.09.329     Document Type: Article

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