Simultaneous formation of two ripple modes on ion sputtered silicon

Nanotechnology

Volumn 19, Issue 13, 2008, Pages

  Keller, Adrian ^a   Roßbach, Steven ^a   Facsko, Stefan ^a   Möller, Wolfhard ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; SPUTTERING; SURFACE STRUCTURE;

RIPPLE MODES; TIME DEPENDENCE;

AMORPHOUS SILICON;

SILICON;

ARTICLE; CHEMICAL ANALYSIS; ENERGY; MATERIALS TESTING; PRIORITY JOURNAL; TEMPERATURE;

EID: 40549134181     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/13/135303     Document Type: Article

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