-
4
-
-
0141483968
-
-
(Kluwer, New York)
-
J. Orloff, M. Utlaut, and L. Swanson, High Resolution Focused Ion Beam (Kluwer, New York, 2003), p. 136.
-
(2003)
High Resolution Focused Ion Beam
, pp. 136
-
-
Orloff, J.1
Utlaut, M.2
Swanson, L.3
-
5
-
-
0032523780
-
-
1059-910X, 10.1002/(SICI)1097-0029(19980515)41:4<285::AID-JEMT1>3. 0.CO;2-Q
-
L. Giannuzzi, J. L. Brown, S. R. Brown, R. B. Irvin, and F. A. Stevie, Microsc. Res. Tech. 1059-910X 41, 285 (1998). 10.1002/(SICI)1097-0029(19980515) 41:4<285::AID-JEMT1>3.0.CO;2-Q
-
(1998)
Microsc. Res. Tech.
, vol.41
, pp. 285
-
-
Giannuzzi, L.1
Brown, J.L.2
Brown, S.R.3
Irvin, R.B.4
Stevie, F.A.5
-
6
-
-
84892353296
-
-
(Springer, New York), 10.1007/0-387-23313-X-10
-
L. Giannuzzi, B. W. Kempshall, S. M. Schwartz, J. K. Lomness, B. I. Prenitzer, and F. A. Stevie, Introduction to Focused Ion Beams (Springer, New York, 2005), pp. 201-228. 10.1007/0-387-23313-X-10
-
(2005)
Introduction to Focused Ion Beams
, pp. 201-228
-
-
Giannuzzi, L.1
Kempshall, B.W.2
Schwartz, S.M.3
Lomness, J.K.4
Prenitzer, B.I.5
Stevie, F.A.6
-
7
-
-
84892209402
-
-
(Springer, New York), 10.1007/0-387-23313-X-11
-
T. Kamino, T. Yaguchi, T. Hashimoto, T. Ohnishi, and K. Umemura, Introduction to Focused Ion Beams (Springer, New York, 2005), pp. 229-245. 10.1007/0-387-23313-X-11
-
(2005)
Introduction to Focused Ion Beams
, pp. 229-245
-
-
Kamino, T.1
Yaguchi, T.2
Hashimoto, T.3
Ohnishi, T.4
Umemura, K.5
-
9
-
-
33644922253
-
Recent developments in nanofabrication using focused ion beams
-
DOI 10.1002/smll.200500113
-
A. A. Tseng, Small 1613-6810 1, 924 (2005). 10.1002/smll.200500113 (Pubitemid 43951685)
-
(2005)
Small
, vol.1
, Issue.10
, pp. 924-939
-
-
Tseng, A.A.1
-
10
-
-
0035396298
-
A review of focused ion beam applications in microsystem technology
-
DOI 10.1088/0960-1317/11/4/301, PII S0960131701189400
-
S. Reyntjens and R. Puers, J. Micromech. Microeng. 0960-1317 11, 287 (2001). 10.1088/0960-1317/11/4/301 (Pubitemid 32660122)
-
(2001)
Journal of Micromechanics and Microengineering
, vol.11
, Issue.4
, pp. 287-300
-
-
Reyntjens, S.1
Puers, R.2
-
12
-
-
79551631999
-
-
edited by R. Hellborg (Springer-Verlag, Berlin), 10.1007/978-3-642-00623- 4-22
-
Y. Fu, in Ion Beam in Nanoscience and Technology, edited by, R. Hellborg, (Springer-Verlag, Berlin, 2009), pp. 293-296. 10.1007/978-3-642-00623-4-22
-
(2009)
Ion Beam in Nanoscience and Technology
, pp. 293-296
-
-
Fu, Y.1
-
13
-
-
79551619304
-
-
edited by L. A. Giannuzzi and F. A. Stevie (Springer, New York), 10.1007/0-387-23313-X-5
-
K. N. Hooghan, in Introduction to Focused Ion Beams Insturmentation: Theory, Techniques, and Practice, edited by, L. A. Giannuzzi, and, F. A. Stevie, (Springer, New York, 2005), pp. 87-106. 10.1007/0-387-23313-X-5
-
(2005)
Introduction to Focused Ion Beams Insturmentation: Theory, Techniques, and Practice
, pp. 87-106
-
-
Hooghan, K.N.1
-
14
-
-
63549111057
-
-
(ASM, Ohio), Vol.
-
C. Rue, S. Herschbein, and C. Scrudato, Proc. ISTFA (ASM, Ohio, 2008), Vol. 34, p. 141.
-
(2008)
Proc. ISTFA
, vol.34
, pp. 141
-
-
Rue, C.1
Herschbein, S.2
Scrudato, C.3
-
15
-
-
79551645061
-
-
edited by V. D. Agrawal (Springer, New York)
-
D. Josephson and B. Gottlieb, in Frontiers in Electronic Testing, edited by, V. D. Agrawal, (Springer, New York, 2006), pp. 77-108.
-
(2006)
Frontiers in Electronic Testing
, pp. 77-108
-
-
Josephson, D.1
Gottlieb, B.2
-
17
-
-
77950260594
-
-
0018-9200, 10.1109/JSSC.2010.2042253
-
D. Somasekhar, B. Srinivasan, G. Pandya, F. Hamzaoglu, M. Khellah, T. Karnik, and K. Zhang, IEEE J. Solid-State Circuits 0018-9200 45, 751 (2010). 10.1109/JSSC.2010.2042253
-
(2010)
IEEE J. Solid-State Circuits
, vol.45
, pp. 751
-
-
Somasekhar, D.1
Srinivasan, B.2
Pandya, G.3
Hamzaoglu, F.4
Khellah, M.5
Karnik, T.6
Zhang, K.7
-
20
-
-
0942289251
-
-
1071-1023, 10.1116/1.1621666
-
V. Ray, N. Antoniou, N. Bassom, A. Krechmer, and A. Saxonis, J. Vac. Sci. Technol. B 1071-1023 21, 2715 (2003). 10.1116/1.1621666
-
(2003)
J. Vac. Sci. Technol. B
, vol.21
, pp. 2715
-
-
Ray, V.1
Antoniou, N.2
Bassom, N.3
Krechmer, A.4
Saxonis, A.5
-
21
-
-
13244267431
-
Focused ion beam induced deposition of low-resistivity copper material
-
DOI 10.1116/1.1826065
-
T. J. Gannon, G. Gu, J. D. Casey, C. Huynh, N. Bassom, and N. Antoniou, J. Vac. Sci. Technol. B 1071-1023 22, 3000 (2004). 10.1116/1.1826065 (Pubitemid 40185058)
-
(2004)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.22
, Issue.6
, pp. 3000-3003
-
-
Gannon, T.J.1
Gu, G.2
Casey, J.D.3
Huynh, C.4
Bassom, N.5
Antoniou, N.6
-
22
-
-
76449093885
-
-
1059-9495, 10.1007/s11665-009-9560-1
-
D. W. Niles, W. Dauksher, and R. W. Kee, J. Mater. Eng. Perform. 1059-9495 19, 900 (2010). 10.1007/s11665-009-9560-1
-
(2010)
J. Mater. Eng. Perform.
, vol.19
, pp. 900
-
-
Niles, D.W.1
Dauksher, W.2
Kee, R.W.3
-
23
-
-
0036649060
-
Evolution of tungsten film deposition induced by focused ion beam
-
DOI 10.1116/1.1486230
-
H. Langfischer, B. Basner, H. Hutter, and E. Bertagnolli, J. Vac. Sci. Technol. A 0734-2101 20, 1408 (2002). 10.1116/1.1486230 (Pubitemid 34882457)
-
(2002)
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
, vol.20
, Issue.4
, pp. 1408-1415
-
-
Langfischer, H.1
Basnar, B.2
Hutter, H.3
Bertagnolli, E.4
-
24
-
-
63549144761
-
-
(ASM, Ohio), Vol.
-
D. W. Niles, J. Meyer, R. W. Kee, and M. DiBattista, Proc. ISTFA (ASM, Ohio, 2008), Vol. 34, p. 133.
-
(2008)
Proc. ISTFA
, vol.34
, pp. 133
-
-
Niles, D.W.1
Meyer, J.2
Kee, R.W.3
Dibattista, M.4
-
25
-
-
0009999382
-
-
1071-1023, 10.1116/1.585669
-
D. K. Stewart, J. A. Morgan, and B. Ward, J. Vac. Sci. Technol. B 1071-1023 9, 2670 (1991). 10.1116/1.585669
-
(1991)
J. Vac. Sci. Technol. B
, vol.9
, pp. 2670
-
-
Stewart, D.K.1
Morgan, J.A.2
Ward, B.3
-
26
-
-
0345711496
-
TEM sample preparation by ion milling/amorphization
-
DOI 10.1016/S0968-4328(99)00011-6, PII S0968432899000116
-
A. Barna, B. Pecz, and M. Menyhard, Micron 0968-4328 30, 267 (1999). 10.1016/S0968-4328(99)00011-6 (Pubitemid 29303262)
-
(1999)
Micron
, vol.30
, Issue.3
, pp. 267-276
-
-
Barna, A.1
Pecz, B.2
Menyhard, M.3
-
27
-
-
0001318393
-
-
0734-2101, 10.1116/1.581795
-
N. I. Kato, Y. Kohno, and H. Saka, J. Vac. Sci. Technol. A 0734-2101 17, 1201 (1999). 10.1116/1.581795
-
(1999)
J. Vac. Sci. Technol. A
, vol.17
, pp. 1201
-
-
Kato, N.I.1
Kohno, Y.2
Saka, H.3
-
29
-
-
0037354330
-
-
0947-8396, 10.1007/s00339-002-1890-x
-
A. Lugstein, B. Basner, J. Smoliner, and E. Bertagnolli, Appl. Phys. A: Mater. Sci. Process. 0947-8396 76, 545 (2003). 10.1007/s00339-002-1890-x
-
(2003)
Appl. Phys. A: Mater. Sci. Process.
, vol.76
, pp. 545
-
-
Lugstein, A.1
Basner, B.2
Smoliner, J.3
Bertagnolli, E.4
-
30
-
-
0037347621
-
-
0957-4484, 10.1088/0957-4484/14/3/310
-
B. D. Huey and R. M. Langford, Nanotechnology 0957-4484 14, 409 (2003). 10.1088/0957-4484/14/3/310
-
(2003)
Nanotechnology
, vol.14
, pp. 409
-
-
Huey, B.D.1
Langford, R.M.2
-
31
-
-
0037666288
-
-
0947-8396, 10.1007/s00339-002-1943-1
-
L. Frey, C. Lehrer, and H. Ryssel, Appl. Phys. A: Mater. Sci. Process. 0947-8396 76, 1017 (2003). 10.1007/s00339-002-1943-1
-
(2003)
Appl. Phys. A: Mater. Sci. Process.
, vol.76
, pp. 1017
-
-
Frey, L.1
Lehrer, C.2
Ryssel, H.3
-
32
-
-
0039782242
-
-
0003-6951, 10.1063/1.1392976
-
A. Grill and V. Patel, Appl. Phys. Lett. 0003-6951 79, 803 (2001). 10.1063/1.1392976
-
(2001)
Appl. Phys. Lett.
, vol.79
, pp. 803
-
-
Grill, A.1
Patel, V.2
-
33
-
-
1642328838
-
-
1071-1023, 10.1116/1.1640401
-
E. Andideh, M. Lerner, G. Palmrose, S. El-Mansy, T. Scherban, G. Xu, and J. Blaine, J. Vac. Sci. Technol. B 1071-1023 22, 196 (2004). 10.1116/1.1640401
-
(2004)
J. Vac. Sci. Technol. B
, vol.22
, pp. 196
-
-
Andideh, E.1
Lerner, M.2
Palmrose, G.3
El-Mansy, S.4
Scherban, T.5
Xu, G.6
Blaine, J.7
-
34
-
-
1142300333
-
-
0026-2714, 10.1016/j.microrel.2003.11.004
-
B. Li, T. D. Sullivan, T. C. Lee, and D. Badami, Microelectron. Reliab. 0026-2714 44, 365 (2004). 10.1016/j.microrel.2003.11.004
-
(2004)
Microelectron. Reliab.
, vol.44
, pp. 365
-
-
Li, B.1
Sullivan, T.D.2
Lee, T.C.3
Badami, D.4
-
35
-
-
0035326272
-
Ion channeling effects on the focused ion beam milling of Cu
-
DOI 10.1116/1.1368670
-
B. W. Kempshall, S. M. Schwarz, B. I. Prenitzer, L. A. Giannuzzi, R. B. Irwin, and F. A. Stevie, J. Vac. Sci. Technol. B 1071-1023 19, 749 (2001). 10.1116/1.1368670 (Pubitemid 32877840)
-
(2001)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.19
, Issue.3
, pp. 749-754
-
-
Kempshall, B.W.1
Schwarz, S.M.2
Prenitzer, B.I.3
Giannuzzi, L.A.4
Irwin, R.B.5
Stevie, F.A.6
-
36
-
-
29044439018
-
Effects of focused gallium ion-beam implantation on properties of nanochannels on silicon-on-insulator substrates
-
DOI 10.1116/1.2101599
-
A. Pan, Y. L. Wang, C. S. Wu, C. D. Chen, and N. W. Liu, J. Vac. Sci. Technol. B 1071-1023 23, 2288 (2005). 10.1116/1.2101599 (Pubitemid 41788672)
-
(2005)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.23
, Issue.6
, pp. 2288-2291
-
-
Pan, A.1
Wang, Y.L.2
Wu, C.S.3
Chen, C.D.4
Liu, N.W.5
-
38
-
-
2342636455
-
-
0960-1317, 10.1088/0960-1317/14/4/R01
-
A. A. Tseng, J. Micromech. Microeng. 0960-1317 14, R15 (2004). 10.1088/0960-1317/14/4/R01
-
(2004)
J. Micromech. Microeng.
, vol.14
, pp. 15
-
-
Tseng, A.A.1
-
42
-
-
0034140916
-
Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction
-
DOI 10.1016/S0040-6090(99)01076-7
-
J. W. Klaus, S. F. Ferro, and S. M. George, Thin Solid Films 0040-6090 360, 145 (2000). 10.1016/S0040-6090(99)01076-7 (Pubitemid 30564551)
-
(2000)
Thin Solid Films
, vol.360
, Issue.1-2
, pp. 145-153
-
-
Klaus, J.W.1
Ferro, S.J.2
George, S.M.3
-
43
-
-
0032592395
-
-
0013-4651, 10.1149/1.1392435
-
K. M. Chang, I. C. Deng, and H. Y. Lin, J. Electrochem. Soc. 0013-4651 146, 3092 (1999). 10.1149/1.1392435
-
(1999)
J. Electrochem. Soc.
, vol.146
, pp. 3092
-
-
Chang, K.M.1
Deng, I.C.2
Lin, H.Y.3
-
44
-
-
0942267547
-
-
1071-1023, 10.1116/1.1627806
-
M. Ishida, J. Fujita, T. Ichihashi, Y. Ochiai, T. Kaito, and S. Matsui, J. Vac. Sci. Technol. B 1071-1023 21, 2728 (2003). 10.1116/1.1627806
-
(2003)
J. Vac. Sci. Technol. B
, vol.21
, pp. 2728
-
-
Ishida, M.1
Fujita, J.2
Ichihashi, T.3
Ochiai, Y.4
Kaito, T.5
Matsui, S.6
|