Ion channeling effects on the focused ion beam milling of Cu

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 3, 2001, Pages 749-754

  Kempshall, B W ^a   Schwarz, S M ^a   Prenitzer, B I ^b   Giannuzzi, L A ^a   Irwin, R B ^b   Stevie, F A ^b  

^a University of Central Florida   (United States)

^b NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GRAIN BOUNDARIES; ION BEAMS; SPUTTERING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ION BEAM MILLING; ION CHANNELING;

COPPER;

EID: 0035326272     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1368670     Document Type: Conference Paper

References (11)

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