Suppression of fluorine penetration by use of in situ stacked chemical vapor deposited tungsten film

Journal of the Electrochemical Society

Volumn 146, Issue 8, 1999, Pages 3092-3096

  Chang, Kow Ming ^a   Deng, I Chung ^a   Lin, Hong Yi ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; CRYSTAL IMPURITIES; FLUORINE; METALLIC FILMS; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; STRUCTURE (COMPOSITION); X RAY DIFFRACTION ANALYSIS;

COLUMNAR STRUCTURE; FLUORINE PENETRATION;

TUNGSTEN;

EID: 0032592395     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392435     Document Type: Article

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