Low-dose focused ion beam nanofabrication and characterization by atomic force microscopy

Nanotechnology

Volumn 14, Issue 3, 2003, Pages 409-412

  Huey, B D ^a   Langford, R M ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DOSIMETRY; ION BEAMS; SILICON;

FOCUSED ION BEAMS (FIB);

NANOTECHNOLOGY;

EID: 0037347621     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/14/3/310     Document Type: Article

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