Tailored ion energy distributions at an rf-biased plasma electrode

Plasma Sources Science and Technology

Volumn 19, Issue 6, 2010, Pages

  Qin, X V ^a   Ting, Y H ^a   Wendt, A E ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PLASMAS; AVERAGE ENERGY; BROAD SPECTRUM; DC COMPONENTS; ION ENERGIES; ION ENERGY DISTRIBUTIONS; ION FLUXES; LOW PRESSURE PLASMA; MATERIALS PROCESSING; PLASMA ELECTRODES; RETARDING FIELD ENERGY ANALYZERS; SHEATH ELECTRIC FIELD; SHEATH VOLTAGE; SUBSTRATE ELECTRODES; VOLTAGE WAVEFORMS; WAVE FORMS;

ARGON; ELECTRIC FIELDS; ELECTRIC POWER DISTRIBUTION; ION BOMBARDMENT; IONS; PLASMA ETCHING; PLASMA SOURCES; SUBSTRATES; SURFACE REACTIONS;

BIAS VOLTAGE;

EID: 78649941317     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/19/6/065014     Document Type: Article

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