Arbitrary substrate voltage wave forms for manipulating energy distribution of bombarding ions during plasma processing

Plasma Sources Science and Technology

Volumn 16, Issue 2, 2007, Pages 257-264

  Patterson, M M ^a,b,c   Chu, H Y ^a,b   Wendt, A E ^a,b  

^a University of Wisconsin Madison   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

^c UNIVERSITY OF WISCONSIN PLATTEVILLE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FAST FOURIER TRANSFORMS; IONS; POWER AMPLIFIERS; PROCESS CONTROL; SUBSTRATES; WAVEFORM ANALYSIS;

BOMBARDING IONS; ENERGY DISTRIBUTION OF IONS (IED); VOLTAGE WAVE FORMS;

PLASMA APPLICATIONS;

EID: 34247487447     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/16/2/007     Document Type: Article

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