Ion energy distributions in rf sheaths; review, analysis and simulation

Plasma Sources Science and Technology

Volumn 8, Issue 3, 1999, Pages

  Kawamura, E ^a   Vahedi, V ^b   Lieberman, M A ^a   Birdsall, C K ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CURRENT DENSITY; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRIC FIELD EFFECTS; ELECTRIC POTENTIAL; ELECTRODES; ELECTRON ENERGY LEVELS; MATHEMATICAL MODELS; PLASMA SHEATHS; REACTIVE ION ETCHING;

COLLISIONLESS CURRENT DRIVEN RADIO FREQUENCY SHEATH; HIGH DENSITY DISCHARGES; ION ENERGY DISTRIBUTION; RADIO FREQUENCY DISCHARGE; RADIO FREQUENCY SHEATHS;

IONS;

EID: 0032654285     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/8/3/202     Document Type: Article

References (50)

1. Charles C, Boswell R W and Porteous R K 1992 Measurement and modeling of ion energy distribution functions in a low pressure argon plasma diffusing from a 13.56 MHz helicon source J. Vac. Sci. Technol. A 10 398
2. Gottscho R A 1993 Ion transport anisotropy in low pressure, high-density plasmas J. Vac. Sci. Technol. B 11 1884
3. Holber W M and Forster J 1990 Ion energetics in electron cyclotron resonance discharges J. Vac. Sci. Technol. A 8 3720
4. Hopwood J 1993 Ion bombardment energy distributions in a radio frequency induction plasma Appl. Phys. Lett. 62 940
5. Wild C and Koidl P 1989 Structured ion energy distribution in radio frequency glow-discharge systems Appl. Phys. Lett. 54 505
6. Wild C and Koidl P 1990 Ion and electron dynamics in the sheath of radio-frequency glow discharges J. Appl. Phys. 69 2909
7. Liu J, Huppert G L and Sawin H H 1990 Ion bombardment in rf plasmas J. Appl. Phys. 68 3916
8. Manenschijn A and Goedheer W J 1991 Angular ion and neutral energy distribution in a collisional rf sheath J. Appl. Phys. 69 2923
9. Benoit-Cattin P, Bernard L C and Bordenave-Montesquieu A 1967 Dispersion en énergie des ions produits par une source à excitation de haute fréquence Entropie 18 29
10. Benoit-Cattin P and Bernard L C 1968 Anomalies of the energy of positive ions extracted from high-frequency ion sources. A theoretical study J. Appl. Phys. 39 5723
11. Farouki R T, Hamaguchi S and Dalvie M 1992 Analysis of a kinematic model for ion transport in rf plasma sheaths Phys. Rev. A 45 5913
12. Tsui R T C 1968 Calculation of ion bombarding energy and its distribution in rf sputtering Phys. Rev. 168 107
13. Metze A, Ernie D W and Oskam H J 1989 The energy distribution of ions bombarding electrode surfaces in rf plasma reactors J. Appl. Phys. 65 993
14. Field D, Klemperer D F, May P W and Song Y P 1991 Ion energy distributions in radio-frequency discharges J. Appl. Phys. 70 82
15. Kushner M J 1985 Distribution of ion energies incident on electrodes in capacitively coupled rf discharges J. Appl. Phys. 58 4024
16. Thompson B E, Sawin H H and Fischer D 1988 Monte-Carlo simulation of ion transport through rf glow-discharge sheaths J. Appl. Phys. 63 2241
17. Barnes M S, Forster J C and Keller J H 1991 Ion kinetics in low-pressure, electropoositive, RF glow discharge sheaths IEEE Trans. Plasma Sci. 19 240
18. May P W, Field D and Klemperer D F 1992 Modeling radio-frequency discharges: effects of collisions upon ion and neutral particle energy distributions J. Appl. Phys. 71 3721
19. Vender D and Boswell R W 1990 Numerical modeling of low-pressure RF plasmas IEEE Trans. Plasma Sci. 18 725
20. Surendra M and Graves D B 1991 Particle simulation of radio-frequency glow discharges IEEE Trans. Plasma Sci. 19 144
21. Erö J 1958 Radiofrequency modulation in the Thonemann ion source Nucl. Instrum. 3 303
22. Okamoto Y and Tamagawa H 1970 Energy dispersion of positive ions effused from an RF plasma J. Phys. Soc. Japan 29 187
23. Coburn J W and Kay E 1972 Positive-ion bombardment of substrates in rf diode glow discharge sputtering J. Appl. Phys. 43 4965
24. Kohler K, Horne D E and Coburn J W 1985 Frequency dependence of ion bombardment of grounded surfaces in rf argon glow discharges in a planar system J. Appl. Phys. 58 3350
25. Kuypers A D and Hopman H J 1988 Ion energy measurement at the powered electrode in an rf discharge J. Appl. Phys. 63 1894
26. Kuypers A D and Hopman H J 1990 Measurement of ion energy distributions at the powered rf electrode in a variable magnetic field J. Appl. Phys. 67 1229
27. Manenschijn A, Janssen G C A M, van der Drift E and Radelaar S 1991 Measurement of ion impact energy and ion flux at the rf electrode of a parallel plate reactive ion etcher J. Appl. Phys. 69 1253
28. Greene W M, Hartney M A, Oldham W G and Hess D W 1988 Ion transit through capacitively coupled Ar sheaths: Ion current and energy distribution J. Appl. Phys. 63 1367
29. + ions at the radio-frequency-powered electrode in reactive ion etching J. Vac. Sci. Technol. A 10 3086
30. + ions at the radio-frequency-powered electrode in reactive ion etching J. Vac. Sci. Technol. A 10 3522
31. 4 reactive-ion etching J. Appl. Phys. 74 659
32. Olthoff J K, Van Brunt R J and Radovanov S B 1992 Ion kinetic-energy distributions in argon rf glow discharges J. Appl. Phys. 72 4566
33. Olthoff J K, Van Brunt J, Radovanov S B, Rees J A and Surowiec R 1994 Kinetic-energy distributions of ions sampled from argon plasmas in a parallel-plate, radio-frequency reference cell J. Appl. Phys. 75 115
34. Snijkers R J M M, van Sambeek M J M, Kroesen B M W and de Hoog F J 1993 Mass-resolved ion energy measurements at the grounded electrode of an argon rf plasma Appl. Phys. Lett. 63 308
35. Flender U and Wiesemann K 1994 Ion distribution functions behind an RF sheath J. Phys. D: Appl. Phys. 27 509
36. Metze A, Ernie D W and Oskam H J 1986 Application of the physics of plasma sheaths to the modeling of rf plasma reactors J. Appl. Phys. 60 3081
37. Song Y P, Field D and Klemperer D F 1990 Electrical potentials in RF discharges J. Phys. D: Appl. Phys. 23 673
38. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Material Processing (New York: John Wiley)
39. Lieberman M A 1988 Analytical solution for capacitive RF sheath IEEE Trans. Plasma Sci. 16 4375
40. Koenig H R and Maissel L I 1970 Application of RF discharges to sputtering IBM J. Res. Dev. 14 168
41. Riley M E 1995 Unified model of the RF plasma sheath Sandia National Laboratories Technical Report SAND95-0775 UC-401
42. Riley M E 1996 Unified model of the RF plasma sheath II Sandia National Laboratories Technical Report SAND96-1948 UC-401
43. Miller P A and Riley M E 1997 Dynamics of collisionless rf plasma sheaths J. Appl. Phys. 82 3689
44. Davis W D and Vanderslice T A 1963 Ion energies at the cathode of a glow discharge Phys. Rev. 131 219
45. Vahedi V, Lieberman M A, Alves M V, Verboncoeur J P and Birdsall C K 1991 A one-dimensional collisional model for plasma-immersion ion implantation J. Appl. Phys. 69 2008
46. Birdsall C K 1991 Particle-in-cell charged-particle simulations, plus Monte Carlo collisions with neutral atoms, PIC-MCC IEEE Trans. Plasma Sci. 19 65
47. Birdsall C K, Kawamura E and Vahedi V 1997 Progress in speeding up PIC-MCC codes applied to RF discharges Int. Symp. on Plasma and Flow Simulation for Materials Processing (ISPFS) (Institute of Fluid Science, Tohoku University, Sendai, Japan, 1997)
48. PDP1 and other particle-in-cell codes may be downloaded from our web site at http://ptsg.eecs.berkeley.edu
49. Llewelyn 1943 Electron Inertia Effects (Cambridge: Cambridge University Press)
50. Birdsall and Bridges 1966 Electron Dynamics of Diode Regions (New York: Academic) ch 2