Effect of nonsinusoidal bias waveforms on ion energy distributions and fluorocarbon plasma etch selectivity

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 5, 2005, Pages 1440-1449

  Agarwal, Ankur ^a   Kushner, Mark J ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b Iowa State University of Science and Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUOROCARBON PLASMAS; ION ENERGIES; ION ENERGY DISTRIBUTIONS (IED);

ELECTRIC POTENTIAL; FLUOROCARBONS; INDUCTIVELY COUPLED PLASMA; SILICA; SILICON WAFERS;

PLASMA ETCHING;

EID: 31144448089     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2013318     Document Type: Article

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