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Volumn 106, Issue 7, 2009, Pages

Accurate control of ion bombardment in remote plasmas using pulse-shaped biasing

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT WAVEFORMS; EXPANDING THERMAL PLASMAS; INTRINSIC CAPACITANCE; ION ENERGIES; ION ENERGY DISTRIBUTIONS; PULSE DURATIONS; PULSED BIASING; RECTANGULAR PULSE; REMOTE PLASMAS; SUBSTRATE VOLTAGE;

EID: 70350119869     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3225690     Document Type: Article
Times cited : (37)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.