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Materials Science and Engineering R: Reports

Volumn 24, Issue 4, 1998, Pages 153-183

Sidewall surface chemistry in directional etching processes

(2) Oehrlein, Gottlieb S a Kurogi, Yukinori b

a STATE UNIVERSITY OF NEW YORK (United States)

b KYUSHU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CRYSTAL MICROSTRUCTURE; DEPOSITION; ORGANIC POLYMERS; PASSIVATION; PLASMA ETCHING; SILICA; SILICON; SURFACE PROPERTIES; TEMPERATURE;

ION ENHANCED ETCHING; MASK MATERIAL REDEPOSITION; SIDEWALL SURFACE CHEMISTRY;

SEMICONDUCTOR MATERIALS;

EID: 0032266836 PISSN: 0927796X EISSN: None Source Type: Journal
DOI: 10.1016/S0927-796X(98)00016-3 Document Type: Article

Times cited : (85)

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