Uniformity of radio frequency bias voltages along conducting surfaces in a plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 1, 1996, Pages 139-143

  Stevens, J E ^a,c   Sowa, M J ^b   Cecchi, J L ^b  

^a PRINCETON PLASMA PHYSICS LABORATORY   (United States)

^b University of New Mexico   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030537678     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.579909     Document Type: Article

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