Ion energy control at substrates during plasma etching of patterned structures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 1882-1887

  Silapunt, R ^a,c   Wendt, A E ^a   Kirmse, K H R ^b  

^a University of Wisconsin Madison   (United States)

^b TEXAS INSTRUMENTS   (United States)

^c KING MONGKUT'S UNIVERSITY OF TECHNOLOGY THONBURI   (Thailand)

Author keywords

[No Author keywords available]

Indexed keywords

ION ENERGY CONTROL; ORGANOSILICATE GLASS (OSG);

BIAS VOLTAGE; DIELECTRIC MATERIALS; FLUOROCARBONS; ION BOMBARDMENT; POLYMERIZATION; SILICON CARBIDE;

PLASMA ETCHING;

EID: 37149013326     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2803723     Document Type: Article

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