Preventing nanoscale wear of atomic force microscopy tips through the use of monolithic ultrananocrystalline diamond probes

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Volumn 6, Issue 10, 2010, Pages 1140-1149

  Liu, J ^a   Grierson, D S ^a   Moldovan, N ^c   Notbohm, J ^a,e   Li, S ^a,f   Jaroenapibal, P ^b,g   O'Connor, S D ^a   Sumant, A V ^d   Neelakantan, N ^c   Carlisle, J A ^c   Turner, K T ^a   Carpick, R W ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b UNIVERSITY OF PENNSYLVANIA   (United States)

^c ADVANCED DIAMOND TECHNOLOGIES INC   (United States)

^d ARGONNE NATIONAL LABORATORY   (United States)

^e CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^f NLIGHT CORPORATION   (United States)

^g KHON KAEN UNIVERSITY   (Thailand)

Author keywords

Atomic force microscopy; Diamond; Mechanical properties; Nanocrystalline materials; Tribology

Indexed keywords

ATOMIC FORCE MICROSCOPY TIPS; CHEMICAL INERTNESS; GRAIN SIZE; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; LOW FRICTION; MODE SCANNING; NANO SCALE; NANO-MANUFACTURING; NANOSCALE WEAR; NEW MATERIAL; PROBE MATERIALS; PROBE-BASED; RELATIVE HUMIDITIES; REPRODUCIBILITIES; SEED LAYER; ULTRA-NANOCRYSTALLINE DIAMOND; ULTRANANOCRYSTALLINE DIAMONDS; WAFER-LEVEL FABRICATION;

ATMOSPHERIC HUMIDITY; ATOMS; DIAMONDS; MATERIALS PROPERTIES; MECHANICAL PROPERTIES; MOISTURE; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PROBES; SILICON NITRIDE; SILICON WAFERS; TRIBOLOGY; WEAR RESISTANCE;

ATOMIC FORCE MICROSCOPY;

DIAMOND; NANOPARTICLE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; INSTRUMENTATION; NANOTECHNOLOGY;

DIAMOND; MICROSCOPY, ATOMIC FORCE; NANOPARTICLES; NANOTECHNOLOGY;

EID: 77952706895     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200901673     Document Type: Article

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