Single asperity tribochemical wear of silicon nitride studied by atomic force microscopy

Journal of Applied Physics

Volumn 92, Issue 9, 2002, Pages 5103-5109

  Maw, W ^a   Stevens, F ^a   Langford, S C ^a   Dickinson, J T ^a  

^a WASHINGTON STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPE (AFM); CHEMICAL NATURE; CLEAVAGE SURFACES; CONTACT FORCES; HYDROXYL GROUPS; INTERMEDIATE STATE; NANO-METER SCALE; SCAN DURATION; SINGLE ASPERITY; SUBSTRATE SURFACE; TIP WEAR; TRIBOCHEMICAL WEAR;

ATOMIC FORCE MICROSCOPY; CARBONATE MINERALS; CHEMICAL BONDS; MICA; SILICON NITRIDE;

SUBSTRATES;

EID: 18744413294     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1510595     Document Type: Article

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