Enhanced nucleation, smoothness and conformality of ultrananocrystalline diamond (UNCD) ultrathin films via tungsten interlayers

Chemical Physics Letters

Volumn 430, Issue 4-6, 2006, Pages 345-350

  Naguib, Nevin N ^a   Elam, Jeffrey W ^a   Birrell, James ^b   Wang, Jian ^a   Grierson, David S ^c   Kabius, Bernd ^a   Hiller, Jon M ^a   Sumant, Anirudha V ^c   Carpick, Robert W ^c   Auciello, Orlando ^a   Carlisle, John A ^a,b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b ADVANCED DIAMOND TECHNOLOGIES INC   (United States)

^c University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BONDED CARBON; INTERFACIAL VOIDS; NUCLEATION DENSITY; ULTRANANOCRYSTALLINE DIAMOND (UNCD);

MICROWAVES; NANOSTRUCTURED MATERIALS; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRUCTURAL OPTIMIZATION; SURFACE ROUGHNESS; TUNGSTEN; ULTRATHIN FILMS;

DIAMOND FILMS;

EID: 33749553569     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2006.08.137     Document Type: Article

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