Stress in Evaporated and Sputtered Thin Films - A Comparison

Surface and Coatings Technology

Volumn 204, Issue 12-13, 2010, Pages 1973-1982

  Koch, R ^a  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

Author keywords

Epitaxy; Evaporation; Physical vapor deposition; Sputtering; Stress; Thin films

Indexed keywords

DEPOSITION TECHNIQUE; EPITAXIAL THIN FILMS; EPITAXY; FILM DEPOSITION; GROWTH PROCESS; HETEROSTRUCTURES; IN-SITU; NOVEL MATERIALS; POLYCRYSTALLINE; SPUTTERED THIN FILMS; SPUTTERING TECHNIQUES; STRESS EVOLUTION; STRESS GENERATION; STRESS MECHANISMS;

CRYSTAL GROWTH; EPITAXIAL FILMS; EVAPORATION; FILMS; MATERIALS PROPERTIES; PHYSICAL VAPOR DEPOSITION; VAPORS;

DEPOSITION;

EID: 76349122013     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.09.047     Document Type: Article

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