Epitaxial growth of nickel on Si(100) by dc magnetron sputtering

Journal of Applied Physics

Volumn 104, Issue 11, 2008, Pages

  Kreuzpaintner, W ^a   Stormer M ^a   Lott, D ^a   Solina, D ^a   Schreyer, A ^a  

^a INSTITUTE OF MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; EPITAXIAL GROWTH; FILM GROWTH; GROWTH (MATERIALS); HYDROGEN; KERR MAGNETOOPTICAL EFFECT; MAGNETIC FIELD EFFECTS; MAGNETOOPTICAL EFFECTS; MAGNETRONS; METALLIC FILMS; MOLECULAR BEAM EPITAXY; NICKEL ALLOYS; OPTICAL KERR EFFECT; OPTICAL PROPERTIES; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; SUBSTRATES;

DC MAGNETRON SPUTTERING; DEFECT FORMATIONS; DEPOSITION CONDITIONS; DIRECT CURRENT MAGNETRON SPUTTERING; HIGH QUALITIES; MAGNETIC NATURES; NEUTRON REFLECTOMETRY; NICKEL FILMS; SCATTERING TECHNIQUES; SEED LAYERS; SI(001); SI(100); SUBSTRATE TEMPERATURES; TWO STEP DEPOSITIONS; WAFER SUBSTRATES;

NICKEL;

EID: 58149215565     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3032383     Document Type: Article

References (33)

1. Y. -T. Cheng, Y. -L. Chen, M. M. Karmarkar, and W. -J. Meng, Appl. Phys. Lett. 0003-6951 10.1063/1.106312 59, 953 (1991).
2. C. -A. Chang, Appl. Phys. Lett. 0003-6951 10.1063/1.105127 58, 1745 (1991).
3. T. Nishimura, J. Takeda, Y. Asami, Y. Hoshino, and Y. Kido, Surf. Sci. 0039-6028 10.1016/j.susc.2005.05.029 588, 71 (2005).
4. C. -A. Chang, J. C. Liu, and J. Angileilo, Appl. Phys. Lett. 0003-6951 10.1063/1.103902 57, 2239 (1990).
5. T. Ohmi, T. Saito, T. Shibata, and T. Nitta, Appl. Phys. Lett. 0003-6951 10.1063/1.99542 52, 2236 (1988).
6. G. Gubbiotti, G. Carlotti, C. Minarini, S. Loreti, R. Gunnella, and M. De Crescenzi, Surf. Sci. 0039-6028 10.1016/S0039-6028(00)00054-6 449, 218 (2000).
7. H. Jiang, T. J. Klemmer, J. A. Barnard, and E. A. Payzant, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.581489 16, 3376 (1998).
8. J. M. Daughton, Thin Solid Films 0040-6090 10.1016/0040-6090(92)90888-I 216, 162 (1992).
9. P. Castrucci, R. Gunnella, R. Bernardini, A. Montecchiari, R. Carboni, and M. De Crescenzi, Surf. Sci. 482-485, 916 (2001). 0039-6028
10. C. -A. Chang, J. Appl. Phys. 0021-8979 10.1063/1.346127 68, 4873 (1990).
11. C. -A. Chang, J. Magn. Magn. Mater. 109, 43 (1992). 0304-8853
12. A. M. Abdul-Lettif, Physica B 388, 107 (2007). 0921-4526
13. L. Wray and M. Prutton, Thin Solid Films 15, 173 (1973).
14. D. Berling, P. Bertoncini, A. Mehdaoui, P. Wetzel, G. Gewinner, and B. Loegel, J. Magn. Magn. Mater. 0304-8853 10.1016/S0304-8853(01)00453-X 237, 181 (2001).
15. K. S. Grabowski, R. A. Kant, and S. B. Qadri, Processing and Characterization of Materials Using Ion Beam, MRS Symposia Proceedings, Vol. 128 (Materials Research Society, Pittsburgh, 1989), pp. 279-284.
16. N. Hirashita, M. Kinoshita, I. Aikawa, and T. Ajioka, Appl. Phys. Lett. 0003-6951 10.1063/1.102762 56, 451 (1990).
17. V. A. Burrows, Y. J. Chabal, G. S. Higashi, K. Raghavachari, and S. B. Christman, Appl. Phys. Lett. 0003-6951 10.1063/1.100053 53, 998 (1988).
18. B. E. Warren, X-ray Diffraction (Dover, New York, 1990).
19. B. D. Cullity, Elements of X-ray Diffraction, 2nd ed. (Addison-Wesley, Reading, MA, 1978).
20. O. Durand, Thin Solid Films 0040-6090 10.1016/j.tsf.2003.10.052 450, 51 (2004).
21. BENSC HMI, "PARRATT32 or the Reflectivity Tool," http://www.hmi.de/bensc/instrumentation/instrumente/v6/refl/parratt-en.htm
22. J. G. Louderback, A. J. Cox, L. J. Lising, D. C. Douglass, and L. A. Bloomfield, Z. Phys. D: At., Mol. Clusters 0178-7683 10.1007/BF01429175 26, 301 (1993).
23. I. Abbati, L. Braicovich, B. De Michaelis, U. del Pennino, and S. Valeri, Solid State Commun. 0038-1098 10.1016/0038-1098(82)90110-7 43, 199 (1982).
24. G. L. P. Berning and L. L. Levenson, Thin Solid Films 0040-6090 10.1016/0040-6090(78)90164-5 55, 473 (1978).
25. K. L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969).
26. T. Young, Philos. Trans. R. Soc. Lond. 95, 65 (1805). 0261-0523
27. M. Kawamura, Y. Abe, and K. Sasaki, Thin Solid Films 469-470, 491 (2004).
28. J. A. Thornton, Annu. Rev. Mater. Sci. 0084-6600 10.1146/annurev.ms.07. 080177.001323 7, 239 (1977).
29. C. V. Thompson, Annu. Rev. Mater. Sci. 0084-6600 10.1146/annurev.matsci. 20.1.245 20, 245 (1990).
30. C. Ratsch, P. Ruggerone, and M. Scheffler, eprint arXiv:cond-mat/ 9709293v1 [cond-mat.mtrl-sci], 2008.
31. K. L. Chopra and M. R. Randlett, Appl. Phys. Lett. 0003-6951 10.1063/1.1755097 11, 202 (1967).
32. P. H. Leo and M. H. Schwartz, J. Mech. Phys. Solids 48, 2539 (2000). 0022-5096
33. M. Henzler and W. Gpel, Oberflächenphysik des Festkörpers, 2nd ed. (Teubner, Stuttgart, 1994) (in German).