|
Volumn 48, Issue 1, 2000, Pages 31-42
|
Interfaces and stresses in thin films
|
Author keywords
[No Author keywords available]
|
Indexed keywords
COMPRESSIVE STRESS;
GRAIN BOUNDARIES;
INTERFACES (MATERIALS);
MATHEMATICAL MODELS;
MECHANICAL VARIABLES MEASUREMENT;
POLYCRYSTALLINE MATERIALS;
SURFACE MEASUREMENT;
SURFACE PHENOMENA;
TENSILE STRESS;
VAPOR DEPOSITION;
IN SITU CURVATURE MEASUREMENT;
INTERFACE STRESSES;
INTRINSIC STRESSES;
PHYSICAL VAPOR DEPOSITION;
THIN FILMS;
|
EID: 0033874950
PISSN: 13596454
EISSN: None
Source Type: Journal
DOI: 10.1016/S1359-6454(99)00286-4 Document Type: Article |
Times cited : (506)
|
References (34)
|