In situ stress evolution of Co films sputtered onto oxidized Si (100) substrates

Journal of Applied Physics

Volumn 99, Issue 3, 2006, Pages

  Pletea, M ^a   Bruckner W ^a   Wendrock, H ^a   Kaltofen, R ^a   Koch, R ^b  

^a IFW DRESDEN   (Germany)

^b PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; COPPER; GRAIN GROWTH; ION BEAMS; MAGNETRON SPUTTERING; MICROSTRUCTURE; OXIDATION; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; TENSILE STRESS;

FILM MORPHOLOGY; FOCUSED ION BEAM; NUCLEI DENSITY;

METALLIC FILMS;

EID: 33645518877     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2168243     Document Type: Article

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