Origin of compressive residual stress in polycrystalline thin films

Physical Review Letters

Volumn 88, Issue 15, 2002, Pages 1561031-1561034

  Chason, E ^a   Sheldon, B W ^a   Freund, L B ^a   Floro, J A ^b   Hearne, S J ^b  

^a Brown University   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; CHEMICAL VAPOR DEPOSITION; COALESCENCE; COMPRESSIVE STRESS; FILM GROWTH; KINETIC THEORY; MATHEMATICAL MODELS; POLYCRYSTALLINE MATERIALS; PRESSURE EFFECTS; RESIDUAL STRESSES; STRESS RELAXATION; TENSILE STRESS;

POLYCRYSTALLINE THIN FILMS;

THIN FILMS;

EID: 0037091142     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (18)