Tensile stress evolution during deposition of Volmer-Weber thin films

Journal of Applied Physics

Volumn 88, Issue 12, 2000, Pages 7079-7088

  Seel, Steven C ^a   Thompson, Carl V ^a   Hearne, Sean J ^b   Floro, Jerrold A ^b  

^a Massachusetts Institute of Technology   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000550211     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1325379     Document Type: Article

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