Origins of Growth Stresses in Amorphous Semiconductor Thin Films

Physical Review Letters

Volumn 91, Issue 9, 2003, Pages

  Floro, J A ^a   Kotula, P G ^a   Seel, S C ^a   Srolovitz, D J ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ELECTRON BEAMS; FILM GROWTH; RELAXATION PROCESSES; SEMICONDUCTING SILICON; TENSILE STRESS;

ELASTIC COALESCENCE PROCESSES;

THIN FILMS;

EID: 0142120654     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.91.096101     Document Type: Article

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