Observation of the growth mode of TiN during magnetron sputtering using synchrotron radiation

Journal of Applied Physics

Volumn 91, Issue 8, 2002, Pages 5429-5433

  Bottiger, J ^a   Chevallier, J ^a   Petersen, J H ^a   Schell, N ^b   Matz, W ^b   Mucklich A ^b  

^a AARHUS UNIVERSITY   (Denmark)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PLANES; DEPOSITION TEMPERATURES; GRAZING INCIDENCE; GROWTH MODES; HIGHER TEMPERATURES; IN-SITU; LAYER-BY-LAYER GROWTH; MGO; PSEUDOMORPHIC GROWTH; REACTIVE MAGNETRON SPUTTERING; SPECULAR X-RAY REFLECTIVITIES; SURFACE-ROUGHENING; WIDE-ANGLE SCATTERING;

EPITAXIAL GROWTH; MAGNETRON SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY;

TITANIUM NITRIDE;

EID: 0037091857     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1459749     Document Type: Article

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